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Oxidation behavior of monolithic TiN and TiN dispersed in ceramic matrices

The mechanism and kinetics of high-temperature (up to 1500degreesC) oxidation of pressureless-sintered TiN and hot-pressed silicon nitride-TiN, alumina-TiN, aluminum nitride-TiN, and AlON-TiN ceramic composites were studied in air under isothermal and nonisothermal conditions. Analysis of the oxidat...

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Bibliographic Details
Published in:Oxidation of metals 1993-02, Vol.39 (1-2), p.69-91
Main Authors: GOGOTSI, Y. G, PORZ, F, DRANSFIELD, G
Format: Article
Language:English
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Summary:The mechanism and kinetics of high-temperature (up to 1500degreesC) oxidation of pressureless-sintered TiN and hot-pressed silicon nitride-TiN, alumina-TiN, aluminum nitride-TiN, and AlON-TiN ceramic composites were studied in air under isothermal and nonisothermal conditions. Analysis of the oxidation products revealed the formation of rutile in the temperature range from 600 to 1000degreesC. An interaction of TiO2 with the matrix and/or its oxidation products was observed at higher temperatures. The oxidation of TiN- containing composites shows different behavior depending on the temperature. The presence of fine isolated inclusions of TiN ( < < 30 mass%) in the silicon- nitride matrix does not change the mass gain during oxidation or increases it only slightly, as compared with a TiN-free material. For materials containing a continuous skeleton of TiN ( > 30 mass%) a noticeable increase of the oxidation rate was observed.
ISSN:0030-770X
1573-4889
DOI:10.1007/bf00666611