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AuN films - structure and chemical binding

AuN films were produced on 304 stainless steel using an arc‐pulsed – assisted plasma physical vapor deposition system. The deposition was performed using an Au target in a nitrogen atmosphere at different pressures. The films were characterized using x‐ray photoelectron spectroscopy and x‐ray diffra...

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Published in:Surface and interface analysis 2015-06, Vol.47 (6), p.701-705
Main Authors: Quintero, J. H., Arango, P. J., Ospina, R., Mello, A., Mariño, A.
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Language:English
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container_issue 6
container_start_page 701
container_title Surface and interface analysis
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creator Quintero, J. H.
Arango, P. J.
Ospina, R.
Mello, A.
Mariño, A.
description AuN films were produced on 304 stainless steel using an arc‐pulsed – assisted plasma physical vapor deposition system. The deposition was performed using an Au target in a nitrogen atmosphere at different pressures. The films were characterized using x‐ray photoelectron spectroscopy and x‐ray diffraction. A 398.1‐eV binding energy was observed and assigned to gold nitride species. The x‐ray diffraction patterns displayed a crystallographic structure that corresponded to the Au‐fcc phase with broad diffraction lines. The observed widening of the Bragg diffraction lines (rocking curves) can be attributed to the presence of interstitial nitrogen atoms in the Au‐fcc structure. Copyright © 2015 John Wiley & Sons, Ltd.
doi_str_mv 10.1002/sia.5766
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subjects arc-pulsed - PAPVD
AuN
Austenitic stainless steels
binding energy
Diffraction
Diffraction patterns
Gold
interstitial nitrogen
Interstitials
Nitrides
Nitrogen atoms
rocking curve
transition metallic nitrides
X-rays
title AuN films - structure and chemical binding
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