Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface chargi...

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Bibliographic Details
Published in:Journal of the American Society for Mass Spectrometry 2015-08, Vol.26 (8), p.1283-1290
Main Authors: Wang, Zhaoying, Liu, Bingwen, Zhao, Evan W., Jin, Ke, Du, Yingge, Neeway, James J., Ryan, Joseph V., Hu, Dehong, Zhang, Kelvin H. L., Hong, Mina, Le Guernic, Solenne, Thevuthasan, Suntharampilai, Wang, Fuyi, Zhu, Zihua
Format: Article
Language:English
Subjects:
Analytical Chemistry
Argon
Argon - chemistry
Bioinformatics
Biotechnology
Calcium Compounds
Cesium
Chemistry
Chemistry and Materials Science
Clusters
Computer simulation
Corrosion tests
Depth profiling
Insulation
Mass spectrometry
Organic Chemistry
Oxides
Proteomics
Radioactive wastes
Research Article
Spectrometry, Mass, Secondary Ion - methods
Sputtering
Thin films
Titanium
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Summary:The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass (SON68) and layered hole-perovskite oxide thin films were selected as model systems because of their fundamental and practical significance. Our results show that high sputter rates and accurate interfacial information can be achieved simultaneously for argon cluster sputtering, whereas this is not the case for cesium and oxygen sputtering. Therefore, the implementation of an argon cluster sputtering source can significantly improve the analysis efficiency of insulating materials and, thus, can expand its applications to the study of glass corrosion, perovskite oxide thin film characterization, and many other systems of interest. Graphical Abstract ᅟ
ISSN:1044-0305
1879-1123
DOI:10.1007/s13361-015-1159-1