In Vacuo Photoemission Studies of Platinum Atomic Layer Deposition Using Synchrotron Radiation

The mechanism of platinum atomic layer deposition using (methylcyclopentadienyl)trimethylplatinum and oxygen is investigated with in vacuo photoemission spectroscopy at the Stanford Synchrotron Radiation Lightsource. With this surface-sensitive technique, the surface species following the Pt precurs...

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Bibliographic Details
Published in:The journal of physical chemistry letters 2013-01, Vol.4 (1), p.176-179
Main Authors: Geyer, Scott M, Methaapanon, Rungthiwa, Shong, Bonggeun, Pianetta, Piero A, Bent, Stacey F
Format: Article
Language:English
Subjects:
Surfaces, Interfaces, Porous Materials, and Catalysis
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Summary:The mechanism of platinum atomic layer deposition using (methylcyclopentadienyl)trimethylplatinum and oxygen is investigated with in vacuo photoemission spectroscopy at the Stanford Synchrotron Radiation Lightsource. With this surface-sensitive technique, the surface species following the Pt precursor half cycle and the oxygen counter-reactant half cycle can be directly measured. We observed significant amounts of carbonaceous species following the Pt precursor pulse, consistent with dehydrogenation of the precursor ligands. Significantly more carbon is observed when deposition is carried out in the thermal decomposition temperature region. The carbonaceous layer is removed during the oxygen counter reactant pulse, and the photoemission spectrum shows that a layer of adsorbed oxygen remains on the surface as previously predicted.
ISSN:1948-7185
1948-7185
DOI:10.1021/jz301475z