Detection of overlay error in double patterning gratings using phase-structured illumination

With the help of simulations we study the benefits of using coherent, phase-structured illumination to detect the overlay error in resist gratings fabricated by double patterning. Evaluating the intensity and phase distribution along the focused spot of a high numerical aperture microscope, the capa...

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Bibliographic Details
Published in:Optics express 2015-09, Vol.23 (19), p.24246-24256
Main Authors: Peterhänsel, Sandy, Gödecke, Maria Laura, Paz, Valeriano Ferreras, Frenner, Karsten, Osten, Wolfgang
Format: Article
Language:English
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Summary:With the help of simulations we study the benefits of using coherent, phase-structured illumination to detect the overlay error in resist gratings fabricated by double patterning. Evaluating the intensity and phase distribution along the focused spot of a high numerical aperture microscope, the capability of detecting magnitude and direction of overlay errors in the range of a few nanometers is investigated for a wide range of gratings. Furthermore, two measurement approaches are presented and tested for their reliability in the presence of white Gaussian noise.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.23.024246