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Enhancement of Spectral Response in mu c - Si1-x Gex :H Thin-Film Solar Cells with a-Si:H/ mu c-Si:H P-Type Window Layers
The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon ( mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO sub(2) :F-coated glass subst...
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Published in: | International journal of photoenergy 2015-01, Vol.2015 |
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container_title | International journal of photoenergy |
container_volume | 2015 |
creator | Huang, Yen-Tang Hsu, Cheng-Hang Tsai, Chuang-Chuang |
description | The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon ( mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO sub(2) :F-coated glass substrates. The substrates of SnO sub(2) :F, SnO sub(2) :F/ mu c-Si:H(p), and SnO sub(2) :F/a-Si:H(p) were exposed to H sub(2) plasma to investigate the property change. Our results showed that capping a thin layer of a-Si:H(p) on SnO sub(2) :F can minimize the Sn reduction during the deposition process which had H sub(2) -containing plasma. Optical measurement has also revealed that a-Si:H(p) capped SnO sub(2) :F glass had a higher optical transmittance. When the 20 nm mu c-Si:H(p) layer was replaced by a 3 nm a-Si:H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency ( eta ) and the short-circuit current density ( sub(JSC) ) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/ mu c-Si:H(p) window layer, with sub(VOC) = 490 mV, sub(JSC) = 19.50 mA/cm super(2) , and FF = 64.83%. |
doi_str_mv | 10.1155/2015/841614 |
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The substrates of SnO sub(2) :F, SnO sub(2) :F/ mu c-Si:H(p), and SnO sub(2) :F/a-Si:H(p) were exposed to H sub(2) plasma to investigate the property change. Our results showed that capping a thin layer of a-Si:H(p) on SnO sub(2) :F can minimize the Sn reduction during the deposition process which had H sub(2) -containing plasma. Optical measurement has also revealed that a-Si:H(p) capped SnO sub(2) :F glass had a higher optical transmittance. When the 20 nm mu c-Si:H(p) layer was replaced by a 3 nm a-Si:H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency ( eta ) and the short-circuit current density ( sub(JSC) ) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/ mu c-Si:H(p) window layer, with sub(VOC) = 490 mV, sub(JSC) = 19.50 mA/cm super(2) , and FF = 64.83%.</description><identifier>ISSN: 1110-662X</identifier><identifier>EISSN: 1687-529X</identifier><identifier>DOI: 10.1155/2015/841614</identifier><language>eng</language><subject>Capping ; Deposition ; Glass ; Photovoltaic cells ; Silicon substrates ; Solar cells ; Thin films ; Tin dioxide ; Tin oxides</subject><ispartof>International journal of photoenergy, 2015-01, Vol.2015</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925,37013</link.rule.ids></links><search><creatorcontrib>Huang, Yen-Tang</creatorcontrib><creatorcontrib>Hsu, Cheng-Hang</creatorcontrib><creatorcontrib>Tsai, Chuang-Chuang</creatorcontrib><title>Enhancement of Spectral Response in mu c - Si1-x Gex :H Thin-Film Solar Cells with a-Si:H/ mu c-Si:H P-Type Window Layers</title><title>International journal of photoenergy</title><description>The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon ( mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO sub(2) :F-coated glass substrates. The substrates of SnO sub(2) :F, SnO sub(2) :F/ mu c-Si:H(p), and SnO sub(2) :F/a-Si:H(p) were exposed to H sub(2) plasma to investigate the property change. Our results showed that capping a thin layer of a-Si:H(p) on SnO sub(2) :F can minimize the Sn reduction during the deposition process which had H sub(2) -containing plasma. Optical measurement has also revealed that a-Si:H(p) capped SnO sub(2) :F glass had a higher optical transmittance. When the 20 nm mu c-Si:H(p) layer was replaced by a 3 nm a-Si:H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency ( eta ) and the short-circuit current density ( sub(JSC) ) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/ mu c-Si:H(p) window layer, with sub(VOC) = 490 mV, sub(JSC) = 19.50 mA/cm super(2) , and FF = 64.83%.</description><subject>Capping</subject><subject>Deposition</subject><subject>Glass</subject><subject>Photovoltaic cells</subject><subject>Silicon substrates</subject><subject>Solar cells</subject><subject>Thin films</subject><subject>Tin dioxide</subject><subject>Tin oxides</subject><issn>1110-662X</issn><issn>1687-529X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqVjL1OwzAURi0EEuVn4gXuyGLimx8n7Vq1ZGBAJBLdKivcKkaOHXITtXl7qooXYDpnON8nxBOqF8Qsi2KFWVSkqDG9EgvURS6zeLm7PjuiklrHu1txx_ytVKqLJF-IeeNb4xvqyI8QDlD11IyDcfBB3AfPBNZDN0EDEiqL8gSvdIJVCXVrvdxa10EVnBlgTc4xHO3YgpGVXZXRZXZReJf13BN8Wv8VjvBmZhr4QdwcjGN6_OO9eN5u6nUp-yH8TMTjvrPcnF-NpzDxHnMslrFScZL8I_0FDTVTKA</recordid><startdate>20150101</startdate><enddate>20150101</enddate><creator>Huang, Yen-Tang</creator><creator>Hsu, Cheng-Hang</creator><creator>Tsai, Chuang-Chuang</creator><scope>7SP</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>KR7</scope><scope>L7M</scope></search><sort><creationdate>20150101</creationdate><title>Enhancement of Spectral Response in mu c - Si1-x Gex :H Thin-Film Solar Cells with a-Si:H/ mu c-Si:H P-Type Window Layers</title><author>Huang, Yen-Tang ; Hsu, Cheng-Hang ; Tsai, Chuang-Chuang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_miscellaneous_17189200233</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Capping</topic><topic>Deposition</topic><topic>Glass</topic><topic>Photovoltaic cells</topic><topic>Silicon substrates</topic><topic>Solar cells</topic><topic>Thin films</topic><topic>Tin dioxide</topic><topic>Tin oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Huang, Yen-Tang</creatorcontrib><creatorcontrib>Hsu, Cheng-Hang</creatorcontrib><creatorcontrib>Tsai, Chuang-Chuang</creatorcontrib><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>International journal of photoenergy</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Huang, Yen-Tang</au><au>Hsu, Cheng-Hang</au><au>Tsai, Chuang-Chuang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhancement of Spectral Response in mu c - Si1-x Gex :H Thin-Film Solar Cells with a-Si:H/ mu c-Si:H P-Type Window Layers</atitle><jtitle>International journal of photoenergy</jtitle><date>2015-01-01</date><risdate>2015</risdate><volume>2015</volume><issn>1110-662X</issn><eissn>1687-529X</eissn><abstract>The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon ( mu c-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO sub(2) :F-coated glass substrates. The substrates of SnO sub(2) :F, SnO sub(2) :F/ mu c-Si:H(p), and SnO sub(2) :F/a-Si:H(p) were exposed to H sub(2) plasma to investigate the property change. Our results showed that capping a thin layer of a-Si:H(p) on SnO sub(2) :F can minimize the Sn reduction during the deposition process which had H sub(2) -containing plasma. Optical measurement has also revealed that a-Si:H(p) capped SnO sub(2) :F glass had a higher optical transmittance. When the 20 nm mu c-Si:H(p) layer was replaced by a 3 nm a-Si:H(p)/17 nm mu c-Si:H(p) double window layer in the cell, the conversion efficiency ( eta ) and the short-circuit current density ( sub(JSC) ) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nm mu c-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/ mu c-Si:H(p) window layer, with sub(VOC) = 490 mV, sub(JSC) = 19.50 mA/cm super(2) , and FF = 64.83%.</abstract><doi>10.1155/2015/841614</doi></addata></record> |
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subjects | Capping Deposition Glass Photovoltaic cells Silicon substrates Solar cells Thin films Tin dioxide Tin oxides |
title | Enhancement of Spectral Response in mu c - Si1-x Gex :H Thin-Film Solar Cells with a-Si:H/ mu c-Si:H P-Type Window Layers |
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