Exact Analytical Solutions of Charged Monomer and Dimer Deposition Models in One and Two Dimensions

Our work is motivated by the manufacturing process of self-assembled antireflective coatings using silica and titania nanoparticles. During the manufacturing process, it is highly desirable to know the time dependent analytical relationship between the index of refraction of the coating and the part...

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Bibliographic Details
Published in:Journal of physics. Conference series 2013-01, Vol.417 (1), p.12070-6
Main Authors: Mazilu, D A, Mazilu, I, Williams, H T
Format: Article
Language:English
Subjects:
Antireflection coatings
Charged particles
Coatings
Density
Deposition
Dimers
Exact solutions
Linear algebra
Manufacturing
Mathematical analysis
Monomers
Nanoparticles
Particle density (concentration)
Particle interactions
Physics
Refractivity
Self-assembly
Silicon dioxide
Time dependence
Titanium dioxide
Two dimensional models
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Summary:Our work is motivated by the manufacturing process of self-assembled antireflective coatings using silica and titania nanoparticles. During the manufacturing process, it is highly desirable to know the time dependent analytical relationship between the index of refraction of the coating and the particle density of the jammed state. We present exact analytical results of one-dimensional cooperative sequential adsorption (CSA) models for two cases: monomer and dimer deposition of charged particles. We extend our study to two-dimensional deposition models on Cayley trees for charged monomers and dimers. Using standard linear algebra techniques, we introduce the general methodology for finding the exact analytical solutions for the monomer and dimer deposition of charged particles and discuss the time dependence of particle density (surface coverage) for some special cases of particle-particle interaction.
ISSN:1742-6596
1742-6588
1742-6596
DOI:10.1088/1742-6596/417/1/012070