Materialization of strained CVD-graphene using thermal mismatch

• Published in: Nano research 2015-06, Vol.8 (6), p.2082-2091
• Main Authors: Lee, Seung-Mo, Kim, Sang-Min, Na, Min Young, Chang, Hye Jung, Kim, Kwang-Seop, Yu, Hyunung, Lee, Hak-Joo, Kim, Jae-Hyun
• Format: Article
• Language: English
• Subjects: Adhesion; Annealing; Atomic/Molecular Structure and Spectra; Biomedicine; Biotechnology; Chemical vapor deposition; Chemistry and Materials Science; Condensed Matter Physics; CVD; Devices; Engineering; Graphene; Materials Science; Nanotechnology; Physics; Research Article; Science; Strain; Tasks; Temperature; Thermal mismatch; Two dimensional; 凝聚态物理; 应变; 热失配; 物化; 理论物理; 界面粘合; 石墨
• ISSN: 1998-0124; 1998-0000
• DOI: 10.1007/s12274-015-0719-9

Theoretical physics foretells that ＂strain engineering＂ of graphene could hold the key to finding treasures still hidden in two-dimensional （2D） condensed matter physics and commercializing graphene-based devices. However, to produce strained graphene in large quantities is not an easy task by any means. Here, we demonstrate that thermal annealing of graphene placed on various substrates could be a surprisingly simple method for preparing strained graphene with a large area. We found that enhanced graphene-substrate interfacial adhesion plays a critical role in developing strained graphene. Creative device architectures that consider the thermal mismatch between graphene and the target substrate could enable the resulting strain to be intentionally tailored. We believe that our proposed method could suggest a shortcut to realization of graphene straintronics.