Ionic properties of ultrathin yttria-stabilized zirconia thin films fabricated by atomic layer deposition with water, oxygen, and ozone

• Published in: Thin solid films 2015-08, Vol.589, p.441-445
• Main Authors: Kim, Ho Keun, Jang, Dong Young, Kim, Jun Woo, Bae, Kiho, Shim, Joon Hyung
• Format: Article
• Language: English
• Subjects: Atomic force microscopy; Atomic layer deposition; Ceramic thin film; Deposition; Ionic conductivity; Oxidant source; Ozone; Thin films; X-ray diffraction; X-ray photoelectron spectroscopy; X-rays; Yttria stabilized zirconia
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2015.05.063

We compared the ionic properties of yttria-stabilized zirconia (YSZ) thin films prepared by atomic layer deposition (ALD) using various oxidants including water, oxygen, and ozone. Cross-plane conductivity measurements were performed at low temperature (50°C) and high temperature (450°C) using AC impedance spectroscopy. As a result, we have confirmed that the conductivity of ALD YSZ films below 300°C is greater by several orders of magnitude compared to the nano-scale YSZ thin films synthesized by other conventional techniques. Among the ALD YSZ samples, ALD YSZ fabricated using water showed the highest conductivity while ALD YSZ fabricated using ozone showed the lowest. We have analyzed this result in relation with grain morphology characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM), and the chemical binding states measured by X-ray photoelectron spectroscopy (XPS). •YSZ is prepared by atomic layer deposition (ALD) with H2O, O2, and O3 as oxidants.•Grain size of ALD YSZ membranes deposited using H2O is the smallest.•Conductivity of ALD YSZ made with H2O shows the highest value below 300°C.•Conductivity trends coincide with the hydroxyl group content measured by XPS.