An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates

We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can...

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Bibliographic Details
Published in:Journal of physics. Conference series 2015-01, Vol.574 (1), p.12087-4
Main Authors: Mazilu, D A, Schwen, E M, Mazilu, I
Format: Article
Language:English
Subjects:
Adsorption
Attachment
Computer simulation
Density
Detachment
Evaporation rate
Mathematical analysis
Mathematical models
Monomers
Optical coatings
Particle density (concentration)
Physics
Stochastic models
Stochasticity
Topology
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Summary:We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can describe a variety of two-state physical systems. We report analytical results for the time-dependent particle density. We compare our analytical results with experimental data and Monte Carlo simulations.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/574/1/012087