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An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates
We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can...
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Published in: | Journal of physics. Conference series 2015-01, Vol.574 (1), p.12087-4 |
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container_title | Journal of physics. Conference series |
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creator | Mazilu, D A Schwen, E M Mazilu, I |
description | We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can describe a variety of two-state physical systems. We report analytical results for the time-dependent particle density. We compare our analytical results with experimental data and Monte Carlo simulations. |
doi_str_mv | 10.1088/1742-6596/574/1/012087 |
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subjects | Adsorption Attachment Computer simulation Density Detachment Evaporation rate Mathematical analysis Mathematical models Monomers Optical coatings Particle density (concentration) Physics Stochastic models Stochasticity Topology |
title | An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates |
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