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An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates

We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can...

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Published in:Journal of physics. Conference series 2015-01, Vol.574 (1), p.12087-4
Main Authors: Mazilu, D A, Schwen, E M, Mazilu, I
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description We present a stochastic model for adsorption and evaporation of monomers with applications to optical coatings. We consider a general case of attachment and detachment rates dependent on the overall number of particles in the system. The model is applicable to all dimensions and topologies, and can describe a variety of two-state physical systems. We report analytical results for the time-dependent particle density. We compare our analytical results with experimental data and Monte Carlo simulations.
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subjects Adsorption
Attachment
Computer simulation
Density
Detachment
Evaporation rate
Mathematical analysis
Mathematical models
Monomers
Optical coatings
Particle density (concentration)
Physics
Stochastic models
Stochasticity
Topology
title An analytical and computational study of a stochastic adsorption model with variable attachment and detachment rates
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