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Electron inelastic mean free paths in solids: A theoretical approach

In the present paper, the inelastic mean free path (IMFP) of incident electrons is calculated as a function of energy for silicon (Si), oxides of silicon (SiO2), SiO, and A1203 in bulk form by employing atomic/molecular inelastic cross sections derived by using a semi-empirical quantum mechanical me...

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Published in:Chinese physics B 2012-09, Vol.21 (9), p.208-214
Main Authors: Pandya, Siddharth H., Vaishnav, B.G., Joshipura, K.N.
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cited_by cdi_FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3
cites cdi_FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3
container_end_page 214
container_issue 9
container_start_page 208
container_title Chinese physics B
container_volume 21
creator Pandya, Siddharth H.
Vaishnav, B.G.
Joshipura, K.N.
description In the present paper, the inelastic mean free path (IMFP) of incident electrons is calculated as a function of energy for silicon (Si), oxides of silicon (SiO2), SiO, and A1203 in bulk form by employing atomic/molecular inelastic cross sections derived by using a semi-empirical quantum mechanical method developed earlier. A general agreement of the present results is found with most of the available data. It is of great importance that we have been able to estimate the minimum IMFP, which corresponds to the peak of inelastic interactions of incident electrons in each solid investigated. New results are presented for SiO, for which no comparison is available. The present work is important in view of the lack of experimental data on the IMFP in solids.
doi_str_mv 10.1088/1674-1056/21/9/093402
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1753545543</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><cqvip_id>43125797</cqvip_id><sourcerecordid>1753545543</sourcerecordid><originalsourceid>FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3</originalsourceid><addsrcrecordid>eNo9kEFOwzAQAC0EEqXwBCRz4xJie-04PlZVC0iVuMDZsh27CUqT1E4PfIW38Ce-QKqinvawM7vSIHRPyRMlZZnTQvKMElHkjOYqJwo4YRdoxogoMyiBX6LZmblGNyl9ElJQwmCG1qvWuzH2HW4635o0Ng7vvOlwiN7jwYx1mjY49W1Tpd-fb7zAY-376CfQtNgMQ-yNq2_RVTBt8nf_c44-1qv35Uu2eXt-XS42mQNZjplnwTKmrIUgC1spE6pggHJRgANaUmIllcFKS2nhZKmI5cw4BgyUcwYqmKPH093p7f7g06h3TXK-bU3n-0PSVAoQXAgOEypOqIt9StEHPcRmZ-KXpkQfu-ljE31sohnVSp-6Td7Dv1f33XbfdNuzyIEyIZWEP6LibLw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1753545543</pqid></control><display><type>article</type><title>Electron inelastic mean free paths in solids: A theoretical approach</title><source>Institute of Physics</source><creator>Pandya, Siddharth H. ; Vaishnav, B.G. ; Joshipura, K.N.</creator><creatorcontrib>Pandya, Siddharth H. ; Vaishnav, B.G. ; Joshipura, K.N.</creatorcontrib><description>In the present paper, the inelastic mean free path (IMFP) of incident electrons is calculated as a function of energy for silicon (Si), oxides of silicon (SiO2), SiO, and A1203 in bulk form by employing atomic/molecular inelastic cross sections derived by using a semi-empirical quantum mechanical method developed earlier. A general agreement of the present results is found with most of the available data. It is of great importance that we have been able to estimate the minimum IMFP, which corresponds to the peak of inelastic interactions of incident electrons in each solid investigated. New results are presented for SiO, for which no comparison is available. The present work is important in view of the lack of experimental data on the IMFP in solids.</description><identifier>ISSN: 1674-1056</identifier><identifier>EISSN: 2058-3834</identifier><identifier>EISSN: 1741-4199</identifier><identifier>DOI: 10.1088/1674-1056/21/9/093402</identifier><language>eng</language><subject>Aluminum oxide ; Cross sections (physics) ; Energy use ; Mathematical analysis ; Mean free path ; Oxides ; Quantum mechanics ; Silicon ; Silicon dioxide ; SiO2 ; 二氧化硅 ; 固体 ; 平均 ; 电子 ; 自由 ; 路径 ; 非弹性</subject><ispartof>Chinese physics B, 2012-09, Vol.21 (9), p.208-214</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3</citedby><cites>FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/85823A/85823A.jpg</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Pandya, Siddharth H.</creatorcontrib><creatorcontrib>Vaishnav, B.G.</creatorcontrib><creatorcontrib>Joshipura, K.N.</creatorcontrib><title>Electron inelastic mean free paths in solids: A theoretical approach</title><title>Chinese physics B</title><addtitle>Chinese Physics</addtitle><description>In the present paper, the inelastic mean free path (IMFP) of incident electrons is calculated as a function of energy for silicon (Si), oxides of silicon (SiO2), SiO, and A1203 in bulk form by employing atomic/molecular inelastic cross sections derived by using a semi-empirical quantum mechanical method developed earlier. A general agreement of the present results is found with most of the available data. It is of great importance that we have been able to estimate the minimum IMFP, which corresponds to the peak of inelastic interactions of incident electrons in each solid investigated. New results are presented for SiO, for which no comparison is available. The present work is important in view of the lack of experimental data on the IMFP in solids.</description><subject>Aluminum oxide</subject><subject>Cross sections (physics)</subject><subject>Energy use</subject><subject>Mathematical analysis</subject><subject>Mean free path</subject><subject>Oxides</subject><subject>Quantum mechanics</subject><subject>Silicon</subject><subject>Silicon dioxide</subject><subject>SiO2</subject><subject>二氧化硅</subject><subject>固体</subject><subject>平均</subject><subject>电子</subject><subject>自由</subject><subject>路径</subject><subject>非弹性</subject><issn>1674-1056</issn><issn>2058-3834</issn><issn>1741-4199</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNo9kEFOwzAQAC0EEqXwBCRz4xJie-04PlZVC0iVuMDZsh27CUqT1E4PfIW38Ce-QKqinvawM7vSIHRPyRMlZZnTQvKMElHkjOYqJwo4YRdoxogoMyiBX6LZmblGNyl9ElJQwmCG1qvWuzH2HW4635o0Ng7vvOlwiN7jwYx1mjY49W1Tpd-fb7zAY-376CfQtNgMQ-yNq2_RVTBt8nf_c44-1qv35Uu2eXt-XS42mQNZjplnwTKmrIUgC1spE6pggHJRgANaUmIllcFKS2nhZKmI5cw4BgyUcwYqmKPH093p7f7g06h3TXK-bU3n-0PSVAoQXAgOEypOqIt9StEHPcRmZ-KXpkQfu-ljE31sohnVSp-6Td7Dv1f33XbfdNuzyIEyIZWEP6LibLw</recordid><startdate>20120901</startdate><enddate>20120901</enddate><creator>Pandya, Siddharth H.</creator><creator>Vaishnav, B.G.</creator><creator>Joshipura, K.N.</creator><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20120901</creationdate><title>Electron inelastic mean free paths in solids: A theoretical approach</title><author>Pandya, Siddharth H. ; Vaishnav, B.G. ; Joshipura, K.N.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Aluminum oxide</topic><topic>Cross sections (physics)</topic><topic>Energy use</topic><topic>Mathematical analysis</topic><topic>Mean free path</topic><topic>Oxides</topic><topic>Quantum mechanics</topic><topic>Silicon</topic><topic>Silicon dioxide</topic><topic>SiO2</topic><topic>二氧化硅</topic><topic>固体</topic><topic>平均</topic><topic>电子</topic><topic>自由</topic><topic>路径</topic><topic>非弹性</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pandya, Siddharth H.</creatorcontrib><creatorcontrib>Vaishnav, B.G.</creatorcontrib><creatorcontrib>Joshipura, K.N.</creatorcontrib><collection>维普_期刊</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>维普中文期刊数据库</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Chinese physics B</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pandya, Siddharth H.</au><au>Vaishnav, B.G.</au><au>Joshipura, K.N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electron inelastic mean free paths in solids: A theoretical approach</atitle><jtitle>Chinese physics B</jtitle><addtitle>Chinese Physics</addtitle><date>2012-09-01</date><risdate>2012</risdate><volume>21</volume><issue>9</issue><spage>208</spage><epage>214</epage><pages>208-214</pages><issn>1674-1056</issn><eissn>2058-3834</eissn><eissn>1741-4199</eissn><abstract>In the present paper, the inelastic mean free path (IMFP) of incident electrons is calculated as a function of energy for silicon (Si), oxides of silicon (SiO2), SiO, and A1203 in bulk form by employing atomic/molecular inelastic cross sections derived by using a semi-empirical quantum mechanical method developed earlier. A general agreement of the present results is found with most of the available data. It is of great importance that we have been able to estimate the minimum IMFP, which corresponds to the peak of inelastic interactions of incident electrons in each solid investigated. New results are presented for SiO, for which no comparison is available. The present work is important in view of the lack of experimental data on the IMFP in solids.</abstract><doi>10.1088/1674-1056/21/9/093402</doi><tpages>7</tpages></addata></record>
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2058-3834
1741-4199
language eng
recordid cdi_proquest_miscellaneous_1753545543
source Institute of Physics
subjects Aluminum oxide
Cross sections (physics)
Energy use
Mathematical analysis
Mean free path
Oxides
Quantum mechanics
Silicon
Silicon dioxide
SiO2
二氧化硅
固体
平均
电子
自由
路径
非弹性
title Electron inelastic mean free paths in solids: A theoretical approach
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T09%3A05%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electron%20inelastic%20mean%20free%20paths%20in%20solids%EF%BC%9A%20A%20theoretical%20approach&rft.jtitle=Chinese%20physics%20B&rft.au=Pandya,%20Siddharth%20H.&rft.date=2012-09-01&rft.volume=21&rft.issue=9&rft.spage=208&rft.epage=214&rft.pages=208-214&rft.issn=1674-1056&rft.eissn=2058-3834&rft_id=info:doi/10.1088/1674-1056/21/9/093402&rft_dat=%3Cproquest_cross%3E1753545543%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c378t-e2fb229bb3f76bd9afdfa314563c31810b717fb7b116c7890b42ac23239cca3d3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1753545543&rft_id=info:pmid/&rft_cqvip_id=43125797&rfr_iscdi=true