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Velocity Control of 180° Domain Walls in Ferroelectric Thin Films by Electrode Modification

The velocity of individual 180° domain walls in thin ferroelectric films of PbZr0.1Ti0.9O3 is strongly dependent on the thickness of the top Pt electrode made by electron-beam induced deposition (EBID). We show that when the thickness is varied in the range

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Published in:Nano letters 2016-01, Vol.16 (1), p.68-73
Main Authors: McGilly, L. J, Feigl, L, Sluka, T, Yudin, P, Tagantsev, A. K, Setter, N
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Language:English
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cited_by cdi_FETCH-LOGICAL-a263t-20e1de7ba9a4c0dc1f87b6df17422b4740cd1c8defb3db144f2070bb238ad8573
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creator McGilly, L. J
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Sluka, T
Yudin, P
Tagantsev, A. K
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description The velocity of individual 180° domain walls in thin ferroelectric films of PbZr0.1Ti0.9O3 is strongly dependent on the thickness of the top Pt electrode made by electron-beam induced deposition (EBID). We show that when the thickness is varied in the range
doi_str_mv 10.1021/acs.nanolett.5b02798
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title Velocity Control of 180° Domain Walls in Ferroelectric Thin Films by Electrode Modification
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