New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses

A new method of Plasma Immersion Ion Implantation (PIII) and deposition (PIII and D) for treating industrial components in the batch mode has been developed. A metal tubular fixture is used to allocate the components inside, around, and along the tube, exposing only the parts of each component that...

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Bibliographic Details
Published in:Review of scientific instruments 2016-01, Vol.87 (1), p.013902-013902
Main Authors: Ueda, Mario, da Silva, Ataide Ribeiro, Pillaca, Elver J D M, Mariano, Samantha F M, Oliveira, Rogério de Moraes, Rossi, José Osvaldo, Lepienski, Carlos Mauricio, Pichon, Luc
Format: Article
Language:English
Subjects:
Batch processing
Deposition
Electric potential
High voltages
Hollow cathodes
Ion implantation
Plasma
Scientific apparatus & instruments
Submerging
Vacuum chambers
Voltage pulses
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Summary:A new method of Plasma Immersion Ion Implantation (PIII) and deposition (PIII and D) for treating industrial components in the batch mode has been developed. A metal tubular fixture is used to allocate the components inside, around, and along the tube, exposing only the parts of each component that are to be ion implanted to the plasma. Hollow cathode-like plasma is generated only inside the tube filled with the desired gas, by applying high negative voltage pulses to the hollow cylindrical fixture which is insulated from the vacuum chamber walls. This is a very convenient method of batch processing of industrial parts by ion implantation, in which a large number of small to medium sized components can be treated by PIII and PIII and D, very quickly, efficiently, and also at low cost.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.4939013