Highly Asymmetric Lamellar Nanopatterns via Block Copolymer Blends Capable of Hydrogen Bonding

Highly asymmetric lamellar microdomains, such as those required for many lithographic line patterns, cannot be straightforwardly achieved by conventional block copolymer self-assembly. We present a conceptually new and versatile approach to produce highly asymmetric lamellar morphologies by the use...

Full description

Saved in:
Bibliographic Details
Published in:ACS nano 2012-09, Vol.6 (9), p.7966-7972
Main Authors: Han, Sung Hyun, Pryamitsyn, Victor, Bae, Dusik, Kwak, Jongheon, Ganesan, Venkat, Kim, Jin Kon
Format: Article
Language:English
Subjects:
Asymmetry
Blends
Block copolymers
Computer Simulation
Crystallization - methods
Hydrogen - chemistry
Hydrogen Bonding
Macromolecular Substances - chemistry
Materials Testing
Models, Chemical
Models, Molecular
Molecular Conformation
Morphology
Nanostructure
Nanostructures - chemistry
Nanostructures - ultrastructure
Particle Size
Polymer blends
Polymers - chemistry
Self assembly
Strategy
Surface Properties
Thin films
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Highly asymmetric lamellar microdomains, such as those required for many lithographic line patterns, cannot be straightforwardly achieved by conventional block copolymer self-assembly. We present a conceptually new and versatile approach to produce highly asymmetric lamellar morphologies by the use of binary blends of block copolymers whose components are capable of hydrogen bonding. We first demonstrate our strategy in bulk systems and complement the experimental results observed by transmission electron microscopy and small-angle X-ray scattering with theoretical calculations based on strong stretching theory to suggest the generality of the strategy. To illustrate the impact on potential lithographic applications, we demonstrate that our strategy can be transferred to thin film morphologies. For this purpose, we used solvent vapor annealing to prepare thin films with vertically oriented asymmetric lamellar patterns that preserve the bulk morphological characteristics. Due to the highly asymmetric lamellar microdomains, the line width is reduced to sub-10 nm scale, while its periodicity is precisely tuned.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn3025089