Direct and Reliable Patterning of Plasmonic Nanostructures with Sub-10-nm Gaps

Nanoscale gaps in metal films enable strong field enhancements in plasmonic structures. However, the reliable fabrication of ultrasmall gaps (

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Bibliographic Details
Published in:ACS nano 2011-09, Vol.5 (9), p.7593-7600
Main Authors: Duan, Huigao, Hu, Hailong, Kumar, Karthik, Shen, Zexiang, Yang, Joel K. W
Format: Article
Language:English
Subjects:
Electron beam lithography
Gold
Lithography
Metal films
Nanostructure
Patterning
Plasmonics
Plasmons
Raman scattering
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Description
Summary:Nanoscale gaps in metal films enable strong field enhancements in plasmonic structures. However, the reliable fabrication of ultrasmall gaps (
ISSN:1936-0851
1936-086X
DOI:10.1021/nn2025868