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Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure
This paper describes a lift-off method of Ag nanowire (Ag NW) patterning using a poly(1H,1H,2H,2H-perfluorodecyl methacrylate) polymer (PFDMA) structure as a mask which is prepared by micro-contact printing. Unlike a conventional photoresist mask, the PFDMA polymer is inert to the dispersion solvent...
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Published in: | Thin solid films 2015-07, Vol.587, p.100-105 |
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container_title | Thin solid films |
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creator | Kim, Myoung-Soo Lee, Da-Hyeok Kim, Ki-Bo Jung, Seok-Heon Lee, Jin-Kyun O, Beom-Hoan Lee, Seung-Gol Park, Se-Geun |
description | This paper describes a lift-off method of Ag nanowire (Ag NW) patterning using a poly(1H,1H,2H,2H-perfluorodecyl methacrylate) polymer (PFDMA) structure as a mask which is prepared by micro-contact printing. Unlike a conventional photoresist mask, the PFDMA polymer is inert to the dispersion solvent of Ag NW. In addition, the hydrofluoroether solvent used for removing the mask layer of patterned PFDMA films after Ag NW deposition does not chemically affect the polyethylene naphthalate (PEN) substrate or poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) coated on Ag NW layer. In this method, Ag NW/PEDOT:PSS composite films were patterned and the effects of the hot-press method were examined to further improve the electrical and optical properties of the composite films. Moreover, the hot-press method at 110°C has an advantage of applying low pressure to make Ag NW/PEDOT:PSS embedded into PEN films compared to that of pressing samples without heating. The ratio of resistance change of patterned and hot-pressed composite film was only below 1% after repeated bending test.
•The patterns of silver nanowire on organic films were formed by lift-off process.•Masking material was fluoropolymer, poly(1H,1H,2H,2H-perfluorodecyl methacrylate).•The fluoropolymer patterns can avoid solvent orthogonality problems.•The patterned composite films can be embedded into organic films by hot pressing.•The embedded composite films have a smooth surface and good mechanical stability. |
doi_str_mv | 10.1016/j.tsf.2015.02.028 |
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•The patterns of silver nanowire on organic films were formed by lift-off process.•Masking material was fluoropolymer, poly(1H,1H,2H,2H-perfluorodecyl methacrylate).•The fluoropolymer patterns can avoid solvent orthogonality problems.•The patterned composite films can be embedded into organic films by hot pressing.•The embedded composite films have a smooth surface and good mechanical stability.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2015.02.028</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Addition polymerization ; Electrodes ; Lift-off process ; Masks ; Micro-contact printing ; Nanowire ; Nanowires ; Patterning ; Poly(1H,1H,2H,2H-perfluorodecyl methacrylate) ; Silver ; Solvents ; Sulfonates</subject><ispartof>Thin solid films, 2015-07, Vol.587, p.100-105</ispartof><rights>2015 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c396t-e06eafc42237676f67a9dc46ba28b64639efd0b148cc7fe3e62ce1b97f5558343</citedby><cites>FETCH-LOGICAL-c396t-e06eafc42237676f67a9dc46ba28b64639efd0b148cc7fe3e62ce1b97f5558343</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Kim, Myoung-Soo</creatorcontrib><creatorcontrib>Lee, Da-Hyeok</creatorcontrib><creatorcontrib>Kim, Ki-Bo</creatorcontrib><creatorcontrib>Jung, Seok-Heon</creatorcontrib><creatorcontrib>Lee, Jin-Kyun</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><title>Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure</title><title>Thin solid films</title><description>This paper describes a lift-off method of Ag nanowire (Ag NW) patterning using a poly(1H,1H,2H,2H-perfluorodecyl methacrylate) polymer (PFDMA) structure as a mask which is prepared by micro-contact printing. Unlike a conventional photoresist mask, the PFDMA polymer is inert to the dispersion solvent of Ag NW. In addition, the hydrofluoroether solvent used for removing the mask layer of patterned PFDMA films after Ag NW deposition does not chemically affect the polyethylene naphthalate (PEN) substrate or poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) coated on Ag NW layer. In this method, Ag NW/PEDOT:PSS composite films were patterned and the effects of the hot-press method were examined to further improve the electrical and optical properties of the composite films. Moreover, the hot-press method at 110°C has an advantage of applying low pressure to make Ag NW/PEDOT:PSS embedded into PEN films compared to that of pressing samples without heating. The ratio of resistance change of patterned and hot-pressed composite film was only below 1% after repeated bending test.
•The patterns of silver nanowire on organic films were formed by lift-off process.•Masking material was fluoropolymer, poly(1H,1H,2H,2H-perfluorodecyl methacrylate).•The fluoropolymer patterns can avoid solvent orthogonality problems.•The patterned composite films can be embedded into organic films by hot pressing.•The embedded composite films have a smooth surface and good mechanical stability.</description><subject>Addition polymerization</subject><subject>Electrodes</subject><subject>Lift-off process</subject><subject>Masks</subject><subject>Micro-contact printing</subject><subject>Nanowire</subject><subject>Nanowires</subject><subject>Patterning</subject><subject>Poly(1H,1H,2H,2H-perfluorodecyl methacrylate)</subject><subject>Silver</subject><subject>Solvents</subject><subject>Sulfonates</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNp9kEtLxDAUhYMoOD5-gLss3XS8STpJqyvxDQMKo-uQSW8kQ9vUJFXm39thXAsHzuacw70fIRcM5gyYvNrMc3JzDmwxBz6pOiAzVqm64EqwQzIDKKGQUMMxOUlpAwCMczEjP0vvchGco4PJGWPv-08aHL39pL3pw4-PePX2cP_6fv22WlEbuiEkn5E633aJuhBpjqZPg4nYZ4ot2hxDg4mOabdkqGvHEMMQ2m2HkaYcR5vHiGfkyJk24fmfn5KPx4f3u-di-fr0cne7LKyoZS4QJBpny-lWJZV0Upm6saVcG16tZSlFja6BNSsra5VDgZJbZOtaucViUYlSnJLL_e4Qw9eIKevOJ4tta3oMY9JMKRBCiZJPUbaP2hhSiuj0EH1n4lYz0DvIeqMnyHoHWQOfVE2dm30Hpx--PUadrMfeYjOBs1k3wf_T_gWev4cr</recordid><startdate>20150731</startdate><enddate>20150731</enddate><creator>Kim, Myoung-Soo</creator><creator>Lee, Da-Hyeok</creator><creator>Kim, Ki-Bo</creator><creator>Jung, Seok-Heon</creator><creator>Lee, Jin-Kyun</creator><creator>O, Beom-Hoan</creator><creator>Lee, Seung-Gol</creator><creator>Park, Se-Geun</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20150731</creationdate><title>Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure</title><author>Kim, Myoung-Soo ; Lee, Da-Hyeok ; Kim, Ki-Bo ; Jung, Seok-Heon ; Lee, Jin-Kyun ; O, Beom-Hoan ; Lee, Seung-Gol ; Park, Se-Geun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c396t-e06eafc42237676f67a9dc46ba28b64639efd0b148cc7fe3e62ce1b97f5558343</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Addition polymerization</topic><topic>Electrodes</topic><topic>Lift-off process</topic><topic>Masks</topic><topic>Micro-contact printing</topic><topic>Nanowire</topic><topic>Nanowires</topic><topic>Patterning</topic><topic>Poly(1H,1H,2H,2H-perfluorodecyl methacrylate)</topic><topic>Silver</topic><topic>Solvents</topic><topic>Sulfonates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kim, Myoung-Soo</creatorcontrib><creatorcontrib>Lee, Da-Hyeok</creatorcontrib><creatorcontrib>Kim, Ki-Bo</creatorcontrib><creatorcontrib>Jung, Seok-Heon</creatorcontrib><creatorcontrib>Lee, Jin-Kyun</creatorcontrib><creatorcontrib>O, Beom-Hoan</creatorcontrib><creatorcontrib>Lee, Seung-Gol</creatorcontrib><creatorcontrib>Park, Se-Geun</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kim, Myoung-Soo</au><au>Lee, Da-Hyeok</au><au>Kim, Ki-Bo</au><au>Jung, Seok-Heon</au><au>Lee, Jin-Kyun</au><au>O, Beom-Hoan</au><au>Lee, Seung-Gol</au><au>Park, Se-Geun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure</atitle><jtitle>Thin solid films</jtitle><date>2015-07-31</date><risdate>2015</risdate><volume>587</volume><spage>100</spage><epage>105</epage><pages>100-105</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><abstract>This paper describes a lift-off method of Ag nanowire (Ag NW) patterning using a poly(1H,1H,2H,2H-perfluorodecyl methacrylate) polymer (PFDMA) structure as a mask which is prepared by micro-contact printing. Unlike a conventional photoresist mask, the PFDMA polymer is inert to the dispersion solvent of Ag NW. In addition, the hydrofluoroether solvent used for removing the mask layer of patterned PFDMA films after Ag NW deposition does not chemically affect the polyethylene naphthalate (PEN) substrate or poly(3,4-ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) coated on Ag NW layer. In this method, Ag NW/PEDOT:PSS composite films were patterned and the effects of the hot-press method were examined to further improve the electrical and optical properties of the composite films. Moreover, the hot-press method at 110°C has an advantage of applying low pressure to make Ag NW/PEDOT:PSS embedded into PEN films compared to that of pressing samples without heating. The ratio of resistance change of patterned and hot-pressed composite film was only below 1% after repeated bending test.
•The patterns of silver nanowire on organic films were formed by lift-off process.•Masking material was fluoropolymer, poly(1H,1H,2H,2H-perfluorodecyl methacrylate).•The fluoropolymer patterns can avoid solvent orthogonality problems.•The patterned composite films can be embedded into organic films by hot pressing.•The embedded composite films have a smooth surface and good mechanical stability.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2015.02.028</doi><tpages>6</tpages></addata></record> |
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subjects | Addition polymerization Electrodes Lift-off process Masks Micro-contact printing Nanowire Nanowires Patterning Poly(1H,1H,2H,2H-perfluorodecyl methacrylate) Silver Solvents Sulfonates |
title | Lift-off patterning of Ag nanowire/PEDOT:PSS composite films for transparent electrodes using a fluoropolymer structure |
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