Anisotropic nanoscratch resistance of WC grains in WC–Co composite

The influence of the crystal orientation of WC grains on their nanoscratch resistance in WC–Co system was investigated. Instrumented nanoindentation with Berkovich tip was used for nanoscratch measurement. Electron backscatter diffraction (EBSD), atomic force microscopy (AFM) and scanning electron m...

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Bibliographic Details
Published in:International journal of refractory metals & hard materials 2015-07, Vol.51, p.188-191
Main Authors: Csanádi, Tamás, Novák, Michal, Naughton-Duszová, Annamária, Dusza, Ján
Format: Article
Language:English
Subjects:
AFM
Atomic force microscopy
Cemented carbides
Cobalt
Electron back scatter diffraction
Grains
Nanostructure
Orientation
Orientation dependence
Scanning electron microscopy
Scratch resistance
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Summary:The influence of the crystal orientation of WC grains on their nanoscratch resistance in WC–Co system was investigated. Instrumented nanoindentation with Berkovich tip was used for nanoscratch measurement. Electron backscatter diffraction (EBSD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) investigations were performed to determine the orientation of WC grains and to study the surface morphology after the scratch test. The scratch resistance of the WC grains exhibits significant angle dependence with higher resistance of grains close to the basal orientation in comparison to the grains close to prismatic orientation. •Significant angle dependence of nanoscratch resistance in WC grains•Higher resistance of grains close to the basal orientation in comparison to the grains close to prismatic orientation•The observed slip lines suggest that most probably the 101¯0112¯3 type slip system is activated.
ISSN:0263-4368
2213-3917
DOI:10.1016/j.ijrmhm.2015.03.005