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Synthesis and characterization of nanocrystalline CdS thin films grown by chemical bath deposition at different molarities for removal of methylene blue

In this work, chemical bath deposition technique has been used to prepare nanocrystalline CdS thin films on glass substrate at different molarities. The structural and morphological characterizations of nanocrystalline thin films were performed by X-ray diffraction and scanning electron microscopy t...

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Bibliographic Details
Published in:Desalination and water treatment 2013-08, Vol.51 (28-30), p.5813-5820
Main Authors: Marathe, Yogesh V., Ramanna, M.M.V., Shrivastava, V.S.
Format: Article
Language:English
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Summary:In this work, chemical bath deposition technique has been used to prepare nanocrystalline CdS thin films on glass substrate at different molarities. The structural and morphological characterizations of nanocrystalline thin films were performed by X-ray diffraction and scanning electron microscopy techniques. The crystallite size found was in the range of 15–45 nm. The optical characterizations of thin films were performed using UV–visible spectroscopy. The optical band gap of chemical bath deposited thin films found to be in the ranged from of 2.30 to 2.45 eV. All thin films have high transparency, that is, greater than 60% in visible spectrum. Thin film prepared at different preparation condition was employed in photocatalytic oxidation of water soluble hazardous cationic methylene blue (MB) dye. Different parameters like the initial dye concentration, pH, and contact time have been studied and optimized. The results showed that MB was successfully removed from aqueous solution in photocatalytic system using thin films obtained at different molarities. The optimum conditions for degradation of dye were pH = 8.5, Initial concentration 30 mg/L and contact time 30 min. It was observed that increase in molarity decreases the grain sizes, which in turn increases the band gap and hence increase in photocatalytic efficiency of nanocrystalline CdS thin film.
ISSN:1944-3986
1944-3994
1944-3986
DOI:10.1080/19443994.2013.769720