Low-loss arrayed waveguide grating at 760 nm

An arrayed waveguide grating (AWG) at 760 nm is demonstrated with an insertion loss smaller than 0.5 dB. Interface roughness and waveguide length errors contribute much more to scattering loss and phase errors at 760 nm than at longer wavelengths, thus requiring improved design and fabrication. This...

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Bibliographic Details
Published in:Optics letters 2016-04, Vol.41 (8), p.1785-1788
Main Authors: Stanton, E J, Spott, A, Davenport, M L, Volet, N, Bowers, J E
Format: Article
Language:English
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Summary:An arrayed waveguide grating (AWG) at 760 nm is demonstrated with an insertion loss smaller than 0.5 dB. Interface roughness and waveguide length errors contribute much more to scattering loss and phase errors at 760 nm than at longer wavelengths, thus requiring improved design and fabrication. This Letter details how this is achieved by minimizing interfacial scattering, grating side-order excitation, and phase errors in the AWG. With silicon nitride core and silicon dioxide clad waveguides on silicon, this AWG is compatible with heterogeneously integrated lasers for on-chip spectral beam combining.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.41.001785