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Phenyl Groups Result in the Highest Benzene Storage and Most Efficient Desulfurization in a Series of Isostructural Metal-Organic Frameworks
A series of isoreticular metal–organic frameworks (MOFs; NENU‐511–NENU‐514), which all have high surface areas and strong adsorption capacities, have been successfully constructed by using mixed ligands. NENU‐513 has the highest benzene capacity of 1687 mg g−1at 298 K, which ranks as the top MOF mat...
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Published in: | Chemistry : a European journal 2015-06, Vol.21 (27), p.9784-9789 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A series of isoreticular metal–organic frameworks (MOFs; NENU‐511–NENU‐514), which all have high surface areas and strong adsorption capacities, have been successfully constructed by using mixed ligands. NENU‐513 has the highest benzene capacity of 1687 mg g−1at 298 K, which ranks as the top MOF material among those reported up to now. This NENU series has been used for adsorptive desulfurization because of its permanent porosity. The results indicate that this series has a higher adsorptive efficiency in the removal of organosulfur compounds than other MOF materials, especially NENU‐511, which has the highest adsorptive efficiency in the ambient atmosphere. This study proves that the design and synthesis of targeted MOFs with higher surface areas and with functional groups present is an efficient method to enhance benzene‐storage capacity and the adsorption of organosulfur compounds.
Taking it all in: A series of isoreticular metal–organic frameworks (NENU‐511–NENU‐514; see picture), with high surface areas and strong adsorption capacities, have been successfully constructed by using mixed ligands. NENU‐513 has the highest benzene capacity of 1687 mg g−1 at 298 K and NENU‐511 has the highest adsorptive efficiency in the removal of organosulfur compounds in the ambient atmosphere. |
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ISSN: | 0947-6539 1521-3765 |
DOI: | 10.1002/chem.201500815 |