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Multifaceted tungsten oxide films grown by thermal evaporation
Thermal evaporation, compared to other vapor phase deposition techniques, is a simple low-cost method to obtain films. Multifaceted tungsten oxide microcrystals were grown as films by the thermal evaporation of tungsten trioxide on (100) silicon substrates covered with SiO2 layer, which were arrange...
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Published in: | Surface & coatings technology 2015-12, Vol.283, p.177-183 |
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creator | Garcia, Irene T.S. Corrêa, Diogo S. de Moura, Diego S. Pazinato, Julia C.O. Pereira, Marcelo B. da Costa, Nadja B.D. |
description | Thermal evaporation, compared to other vapor phase deposition techniques, is a simple low-cost method to obtain films. Multifaceted tungsten oxide microcrystals were grown as films by the thermal evaporation of tungsten trioxide on (100) silicon substrates covered with SiO2 layer, which were arranged vertically inside a horizontal furnace. The structural characterization of these films was carried out through micro-Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffractometry, scanning electron microscopy and Rutherford backscattering spectrometry. The crystals are composed of monoclinic and hexagonal WO3 phases that grew as plates and were arranged radially around multifaceted nuclei. The films present photocatalytic activity, which is evidenced by the accelerated degradation of methyl orange dye, and are resistant to leaching in aqueous media. This initial characterization will enable further exploration of these films as photocatalysts.
•We obtained multifaceted tungsten oxide microcrystals by thermal evaporation.•Multifaceted crystals are composed of plates that grow radially on SiO2/Si substrate.•Tungsten oxide film is resistant to leaching and present low band gap value. |
doi_str_mv | 10.1016/j.surfcoat.2015.10.053 |
format | article |
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•We obtained multifaceted tungsten oxide microcrystals by thermal evaporation.•Multifaceted crystals are composed of plates that grow radially on SiO2/Si substrate.•Tungsten oxide film is resistant to leaching and present low band gap value.</description><subject>Dyes</subject><subject>Evaporation</subject><subject>Leaching resistance</subject><subject>Multifaceted crystals</subject><subject>Nuclei</subject><subject>Photocatalysis</subject><subject>Spectroscopy</subject><subject>Thermal evaporation</subject><subject>Tungsten oxide</subject><subject>Tungsten oxides</subject><subject>Vapor phases</subject><subject>X-rays</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqFkM1OwzAQhC0EEqXwCihHLgl2nNjxBYEq_qQiLnC2HHtdXCVxsZ1C355UhTOn1YxmRtoPoUuCC4IJu14XcQxWe5WKEpN6Mgtc0yM0Iw0XOaUVP0YzXNY8bwQvT9FZjGuMMeGimqGbl7FLzioNCUyWxmEVEwyZ_3YGMuu6Pmar4L-GrN1l6QNCr7oMtmrjg0rOD-foxKouwsXvnaP3h_u3xVO-fH18Xtwtc00FTbmqCcOacqMtw00JggqhSwAljOWmagmlmtWtLQ3BLectZUy3FE_C6Jo3jM7R1WF3E_znCDHJ3kUNXacG8GOUZAoRQaqynqLsENXBxxjAyk1wvQo7SbDcA5Nr-QdM7oHt_QnYVLw9FGF6ZOsgyKgdDBqMC6CTNN79N_EDSmJ4nA</recordid><startdate>20151215</startdate><enddate>20151215</enddate><creator>Garcia, Irene T.S.</creator><creator>Corrêa, Diogo S.</creator><creator>de Moura, Diego S.</creator><creator>Pazinato, Julia C.O.</creator><creator>Pereira, Marcelo B.</creator><creator>da Costa, Nadja B.D.</creator><general>Elsevier B.V</general><scope>6I.</scope><scope>AAFTH</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0003-1647-5054</orcidid></search><sort><creationdate>20151215</creationdate><title>Multifaceted tungsten oxide films grown by thermal evaporation</title><author>Garcia, Irene T.S. ; Corrêa, Diogo S. ; de Moura, Diego S. ; Pazinato, Julia C.O. ; Pereira, Marcelo B. ; da Costa, Nadja B.D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c393t-a5160c37dcf6082e9399c2eea9df7d4b133c65bf2d10b77b366cb3010bdc57863</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Dyes</topic><topic>Evaporation</topic><topic>Leaching resistance</topic><topic>Multifaceted crystals</topic><topic>Nuclei</topic><topic>Photocatalysis</topic><topic>Spectroscopy</topic><topic>Thermal evaporation</topic><topic>Tungsten oxide</topic><topic>Tungsten oxides</topic><topic>Vapor phases</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Garcia, Irene T.S.</creatorcontrib><creatorcontrib>Corrêa, Diogo S.</creatorcontrib><creatorcontrib>de Moura, Diego S.</creatorcontrib><creatorcontrib>Pazinato, Julia C.O.</creatorcontrib><creatorcontrib>Pereira, Marcelo B.</creatorcontrib><creatorcontrib>da Costa, Nadja B.D.</creatorcontrib><collection>ScienceDirect Open Access Titles</collection><collection>Elsevier:ScienceDirect:Open Access</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Garcia, Irene T.S.</au><au>Corrêa, Diogo S.</au><au>de Moura, Diego S.</au><au>Pazinato, Julia C.O.</au><au>Pereira, Marcelo B.</au><au>da Costa, Nadja B.D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Multifaceted tungsten oxide films grown by thermal evaporation</atitle><jtitle>Surface & coatings technology</jtitle><date>2015-12-15</date><risdate>2015</risdate><volume>283</volume><spage>177</spage><epage>183</epage><pages>177-183</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><abstract>Thermal evaporation, compared to other vapor phase deposition techniques, is a simple low-cost method to obtain films. Multifaceted tungsten oxide microcrystals were grown as films by the thermal evaporation of tungsten trioxide on (100) silicon substrates covered with SiO2 layer, which were arranged vertically inside a horizontal furnace. The structural characterization of these films was carried out through micro-Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffractometry, scanning electron microscopy and Rutherford backscattering spectrometry. The crystals are composed of monoclinic and hexagonal WO3 phases that grew as plates and were arranged radially around multifaceted nuclei. The films present photocatalytic activity, which is evidenced by the accelerated degradation of methyl orange dye, and are resistant to leaching in aqueous media. This initial characterization will enable further exploration of these films as photocatalysts.
•We obtained multifaceted tungsten oxide microcrystals by thermal evaporation.•Multifaceted crystals are composed of plates that grow radially on SiO2/Si substrate.•Tungsten oxide film is resistant to leaching and present low band gap value.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2015.10.053</doi><tpages>7</tpages><orcidid>https://orcid.org/0000-0003-1647-5054</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | Dyes Evaporation Leaching resistance Multifaceted crystals Nuclei Photocatalysis Spectroscopy Thermal evaporation Tungsten oxide Tungsten oxides Vapor phases X-rays |
title | Multifaceted tungsten oxide films grown by thermal evaporation |
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