Topology optimization method using multistep mapping from 2D photomask to 3D MEMS

We have developed a topology optimization method for designing a two-dimensional (2D) photomask. It employs micromachining-process-like multistep mapping to analytically improve the characteristics of a three-dimensional (3D) MEMS fabricated by the photomask. We used this method to design reinforcin...

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Bibliographic Details
Main Authors: Ozaki, T., Nomura, T., Fujitsuka, N., Shimaoka, K., Akashi, T.
Format: Conference Proceeding
Language:English
Subjects:
Deformation
Electrodes
Mapping
Mathematical analysis
Mechanical systems
Micromechanical devices
Optimization
Photomasks
Ribs
Strain
Stress
Three dimensional
Topology
Topology optimization
Two dimensional
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Summary:We have developed a topology optimization method for designing a two-dimensional (2D) photomask. It employs micromachining-process-like multistep mapping to analytically improve the characteristics of a three-dimensional (3D) MEMS fabricated by the photomask. We used this method to design reinforcing ribs for an electrostatic micromirror to reduce deformation caused by internal residual stress. Employing a dot-array pattern as the initial topology, the optimization calculation converged after 300 iterations. It predicts a 79.1% reduction in the maximum displacement. To verify this result, micromirror structures were fabricated and their deformations were measured. The deformation was reduced by 87.1% in this experiment. The calculation results agree well with the experimental results, demonstrating the effectiveness of the proposed method.
ISSN:1084-6999
DOI:10.1109/MEMSYS.2013.6474264