Nanogradient all-dielectric films: technology of fabrication and the first experiments

The technology of fabrication of gradient dielectric nanofilms with the predesigned distribution of refractive index by means of magnetron sputtering of the nanofilm components on the movable substrate, based on the prescribed motion of substrate, is presented. The theoretical prediction of giant co...

Full description

Saved in:
Bibliographic Details
Published in:Optical materials express 2014-11, Vol.4 (11), p.2250-2261
Main Authors: Shvartsburg, A.B., Obod, Yu.A., Kuzmichev, A.I., Volpian, O.D., Parkhomenko, Yu.N.
Format: Article
Language:English
Subjects:
Broadband
Dielectrics
Dispersions
Infrared
Magnetron sputtering
Nanostructure
Spectra
Transmittance
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The technology of fabrication of gradient dielectric nanofilms with the predesigned distribution of refractive index by means of magnetron sputtering of the nanofilm components on the movable substrate, based on the prescribed motion of substrate, is presented. The theoretical prediction of giant controllable heterogeneity-induced dispersion of gradient dielectric periodical nanostructures without free carriers is verified by the experimental measurements of their transmittance in visible and near infrared spectral ranges. The unusual transmittance spectra of these structures are distinguished by strong dispersion nearby the red edge of visible range and almost constant high transmittance in the near infrared range. Method of non-destroying control of gradient optical nanolayers, using the X-ray reflectometry of their density distribution, is developed, and the possibility of formation of nanocluster structures of these layers is shown. Potential of periodical gradient all-dielectric nanostructures for flexible design and fabrication of broadband antireflection coatings with sub-wavelength thicknesses is considered.
ISSN:2159-3930
2159-3930
DOI:10.1364/OME.4.002250