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Deep trap-induced dynamic on-resistance degradation in GaN-on-Si power MISHEMTs
Identification and characterization of a single, deep trap causing large increases in the on-resistance of GaN-on-Si power metal-insulator-semiconductor-high electron mobility transistors (MISHEMTs) is reported. This is achieved by using HEMT-based deep level optical spectroscopy (DLOS) and related...
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Published in: | Microelectronics and reliability 2016-01, Vol.56, p.37-44 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Identification and characterization of a single, deep trap causing large increases in the on-resistance of GaN-on-Si power metal-insulator-semiconductor-high electron mobility transistors (MISHEMTs) is reported. This is achieved by using HEMT-based deep level optical spectroscopy (DLOS) and related methods in conjunction with high voltage off-state VDS switching up to 400V. A trap with an activation energy of ~EC−2eV that is physically located in the drain-access region of the MISHEMT is shown to be the primary source of an increase of the dynamic on-resistance increase by as much as ~9 times at 400V operation. Comparisons of trap signatures extracted from the MISHEMT with capacitance-based DLOS measurements of simple Schottky-diode test-structures showing the same, dominant trap signature suggests that the physical defect is located within the GaN buffer and is not a surface or insulator-related defect. A buffer trap based model is presented to explain the observed on-resistance degradation effects in the MISHEMTs during high voltage switching.
•Trap spectroscopy performed on GaN MISHEMTs during high voltage switching.•Single trap (EC−2eV) linked to on-resistance degradation during high voltage switching.•Trap spectroscopy on capacitance test structures confirmed location in GaN buffer.•Localized high-field charging of EC−2eV trap in MISHEMT degrades on-resistance. |
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ISSN: | 0026-2714 1872-941X |
DOI: | 10.1016/j.microrel.2015.10.026 |