Utilization of Polyarylates Having Chemically Introduced Diazonaphthoquinone Structure for Reaction Development Patterning

Polyarylates containing diazonaphthoquinone (DNQ) structure as a photosensitive group in their chains (DNQ-introduced PArs (DPArs)) were synthesized by solution polycondensation using a DNQ having bisphenol structure (BADNQ1) as a diol monomer. Reaction development patterning (RDP) of the DPAr films...

Full description

Saved in:
Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2015/05/11, Vol.28(2), pp.219-227
Main Authors: Oyama, Toshiyuki, Shimada, Nozomi, Takahashi, Akio
Format: Article
Language:English
Subjects:
diazonaphthoquinone (DNQ)
Diols
DNQ-introduced polyarylate (DPAr)
Heating
Mechanical properties
Monomers
Patterning
Photosensitivity
polyarylate
Polyarylates
reaction development patterning (RDP)
Thermal properties
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Polyarylates containing diazonaphthoquinone (DNQ) structure as a photosensitive group in their chains (DNQ-introduced PArs (DPArs)) were synthesized by solution polycondensation using a DNQ having bisphenol structure (BADNQ1) as a diol monomer. Reaction development patterning (RDP) of the DPAr films afforded fine positive-tone patterns in shorter development time and higher resolution than that of the PAr film containing DNQ as an external photosensitive agent. It was also revealed that DPArs could be used as high-molecular-weight photosensitive agents and RDP-based pattern formation using the PAr/DPAr films was achieved in shorter development time and higher resolution than that using the PAr film containing low-molecular-weight DNQ. In addition, the PAr/DPAr film showed higher thermal and mechanical properties than the PAr/DNQ film. Furthermore, mechanical property of the PAr/DPAr was higher than that of the PAr itself, probably due to partial crosslinking induced by carbene species generated from DNQ during heating.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.28.219