Addition of Photosensitivity to Hyperbranched Engineering Plastics based on Reaction Development Patterning

• Published in: Journal of Photopolymer Science and Technology 2014/07/08, Vol.27(2), pp.219-222
• Main Authors: Kawada, Tetsuya, Takahashi, Akio, Oyama, Toshiyuki
• Format: Article
• Language: English
• Subjects: Developers; diazonaphthoquinone; Esters; Evaporation; hyperbranched polyesters; Monomers; Patterning; photosensitive hyperbranched engineering plastics; Photosensitivity; reaction development patterning; Solubilization; Terephthalic acid; tetramethylammonium hydroxide
• ISSN: 0914-9244; 1349-6336
• DOI: 10.2494/photopolymer.27.219

We investigated mechanism of the dissolution of HBPE-NO2 films to the developer by analysis of the developer after development. A HBPE-NO2 film containing BADNQ2 was irradiated with 500 mJ/cm2 of exposure dose and developed with 25wt% TMAHaq. The developer was then neutralized by HClaq. and the solution was evaporated and dried at 90 °C in vacuo. 1H-NMR spectrum of the resulting product after development is shown in Fig. 3. The 1H-NMR spectrum shows signals assigned to the monomers, terephthalic acid derived from TPC and THPE, and 4-nitrobenzoic acid derived from the end groups. However, no signal that can be assigned to the original HBPE-NO2 protons was observed. This result suggests that RDP of HBPE-NO2 is not based on solubilization of the polymer by the reaction at the end groups but on decomposition of the polymer induced by nucleophilic attack of the OH- to the ester linkages to give low-molecular-weight products.