Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications

Alternative materials for plasmonic devices have garnered much recent interest. A promising candidate material is titanium nitride. Although there is a substantial body of work on the formation of this material, its use for plasmonic applications requires a more systematic and detailed optical analy...

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Bibliographic Details
Published in:Optical materials express 2015-12, Vol.5 (12), p.2786-2797
Main Authors: Zgrabik, Christine M., Hu, Evelyn L.
Format: Article
Language:English
Subjects:
Deposition
Devices
Optimization
Plasmonics
Scanning transmission electron microscopy
Titanium nitride
X-ray photoelectron spectroscopy
X-rays
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Summary:Alternative materials for plasmonic devices have garnered much recent interest. A promising candidate material is titanium nitride. Although there is a substantial body of work on the formation of this material, its use for plasmonic applications requires a more systematic and detailed optical analysis than has previously been carried out. This paper describes an initial optimization of sputtered TiN thin films for plasmonic performance from visible into near-IR wavelengths. The metallic behavior of TiN films exhibits a sensitive dependence on the substrate and deposition details. We explored reactive and non-reactive sputter deposition of TiN onto various substrates at both room temperature and 600[degrees]C. Metallic character was compared for films grown under different conditions via spectroscopic ellipsometry and correlated with compositional and structural measurements via x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD), and scanning transmission electron microscopy (STEM).
ISSN:2159-3930
2159-3930
DOI:10.1364/OME.5.002786