Spectroscopic Ellipsometry Analyses on Plasma Treatment of Aluminium Oxide Thin Film

• Published in: Key Engineering Materials 2016, Vol.675-676, p.197-200
• Main Authors: Hom-On, C., Nuntawong, N., Limwichean, S., Horprathum, M., Rakreungdet, W., Eiamchai, Pitak, Chindaudom, P., Lertvanithphol, Tossaporn, Jaroenapibal, P., Patthanasettakul, V.
• Format: Article
• Language: English
• Subjects: Aluminum oxide; Ellipsometry; Refractive index; Refractivity; Scanning electron microscopy; Spectroscopic analysis; Spectroscopy; Thin films
• ISSN: 1013-9826; 1662-9795; 1662-9795
• DOI: 10.4028/www.scientific.net/KEM.675-676.197

Spectroscopic Ellipsometry (SE) was used to analyse the effect of plasma treatment on aluminium oxide thin films. The aluminium oxide thin films were fabricated by reactive DC magnetron sputtering at different operating pressures. The as-deposited thin films were plasma treated at different ambient Ar and O2 conditions. The prepared samples were investigated for physical microstructures with scanning electron microscopy (SEM) and optical characteristics with ellipsometry. The ellipsometric spectra of the prepared samples were measured in the range of 250 to 1650 nm with the incidence angle of 70 degree. Based on the optical model with the Tauc-Lorentz function, the thickness and the refractive index of the films were determined and discussed. The results showed that the thickness and the refractive index of the aluminium oxide thin films were greatly affected after the plasma treatments. In comparison, the results of those prepared at different operating pressures were also discussed. The SE results were confirmed with those from SEM.