Investigation of the surface roughness of CdZnTe substrates by different techniques of nanometer accuracy

The results of measurements of the root-mean-square (rms) surface roughness of CdZnTe substrates by confocal microscopy (CM), atomic force microscopy (AFM), and X-ray reflectometry (XRR) are compared. It is determined that CM yields the highest rms roughness values, AFM assumes an intermediate posit...

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Bibliographic Details
Published in:Journal of communications technology & electronics 2016-03, Vol.61 (3), p.333-337
Main Authors: Burlakov, I. D., Denisov, I. A., Sizov, A. L., Silina, A. A., Smirnova, N. A.
Format: Article
Language:English
Subjects:
Accuracy
Analysis
Articles from the Russian Journal Prikladnaya Fizika
Atomic force microscopy
Cadmium zinc telluride wafers
Cadmium zinc tellurides
Communications Engineering
Confocal
Electronics
Engineering
Investigations
Measurement techniques
Measuring instruments
Methods
Microscopes
Microscopy
Morphology
Networks
Objectives
Position measurement
Radiation
Reproducibility
Roughness
Studies
Substrates
Surface roughness
X-rays
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Summary:The results of measurements of the root-mean-square (rms) surface roughness of CdZnTe substrates by confocal microscopy (CM), atomic force microscopy (AFM), and X-ray reflectometry (XRR) are compared. It is determined that CM yields the highest rms roughness values, AFM assumes an intermediate position, and XRR measurements produce results that are an order of magnitude lower than those obtained with the use of the other two techniques. It is demonstrated that CM rms roughness values depend to a considerable extent on the type of the microscope objective used in experiments. Probable reasons for the discrepancy between the obtained results are discussed.
ISSN:1064-2269
1555-6557
DOI:10.1134/S1064226916030062