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A study of the impact of co-adsorbents on DSSC electron transfer processes: anti- pi -stacking vs.shield effect

In this study we report a detailed exploration of the use of two different co-adsorbents - namely bis-methoxyphenylphosphinic acid (BMPP) and chenodeoxycholic acid (CDCA) - known to increase photoconversion efficiency (PCE) of DSSCs sensitized with N719. We have explored the variation of their abili...

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Bibliographic Details
Published in:Physical chemistry chemical physics : PCCP 2016-03, Vol.18 (14), p.9645-9651
Main Authors: Cisneros, R, Beley, M, Lapicque, F
Format: Article
Language:English
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Summary:In this study we report a detailed exploration of the use of two different co-adsorbents - namely bis-methoxyphenylphosphinic acid (BMPP) and chenodeoxycholic acid (CDCA) - known to increase photoconversion efficiency (PCE) of DSSCs sensitized with N719. We have explored the variation of their abilities with the [co-ads]/[D] ratio of the sensitization bath in order to lower the intermolecular deactivations (anti- pi -stacking effect) and recombinations between photo-injected electrons and the oxidized mediator (shield effect). EIS- lambda technique has been used for this purpose, allowing the two effects considered here to be accurately quantified. DSSC containing BMPP allowed to improve the cell PCE by 60% with a ratio [co-ads]/[D] = 1, exhibiting a strong shield effect, while the maximum PCE obtained with CDCA was slightly over 7% (corresponding to 30% improvement) with a ratio [co-ads]/[D] = 10 and exhibiting a strong anti- pi -stacking effect.
ISSN:1463-9076
1463-9084
DOI:10.1039/c6cp00077k