Modification and simulation of the power supply of a metal vapor laser

The modification of a power supply circuit used for pumping metal vapor lasers is analyzed. The results of OrCAD simulation of the processes that occur in the power supply are presented. The effect of the capacitance ratio on the charging process of a storage capacitor is described. The mode which p...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2016-04, Vol.124 (1), p.12030-12034
Main Authors: Ogorodnikov, D N, Trigub, M V, Torgaev, S N, Vasnev, N A, Evtushenko, T G
Format: Article
Language:English
Subjects:
Charging
Lasers
Metal vapor lasers
Power supplies
Power supply
Power supply circuits
Pulse repetition frequency
Simulation
Thyratrons
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Summary:The modification of a power supply circuit used for pumping metal vapor lasers is analyzed. The results of OrCAD simulation of the processes that occur in the power supply are presented. The effect of the capacitance ratio on the charging process of a storage capacitor is described. The mode which provides more time for the recovery of the thyratron is discussed. The results of the development of the small-size high pulse repetition frequency laser with up to 3 W average output power are presented.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/124/1/012030