Influence of Working Pressure on Ion Sensitive Probe Measurement in Microwave ECR Plasmas

In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investig...

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Bibliographic Details
Published in:Plasma science & technology 2015-04, Vol.17 (4), p.294-297
Main Author: 马志斌 吴俊 谭必松 沈武林 潘鑫 汪建华
Format: Article
Language:English
Subjects:
Drift
ECR
Electric potential
Electrodes
Electron cyclotron resonance
Microwaves
Plasmas
Shielding
Voltage
微波
探针
灵敏
电子回旋共振等离子体
离子敏感
等离子体压力
精确测量
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Summary:In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift.
ISSN:1009-0630
DOI:10.1088/1009-0630/17/4/06