Microstructure and magnetic properties of Fe sub(72.5)Si sub(14.2)B sub(8.7)Nb sub(2)Mo sub(1.5)Cu sub(1.1)Fe72.5Si14.2B8 .7Nb2Mo1.5Cu1.1 thin films

This paper surveys structure and magnetic properties of the thin films with thicknesses of 30, 70, 100 and 200 nm, prepared by high-frequency ion-plasma sputtering of Fe sub(72.5)Si sub(14.2)B sub(8.7)Nb sub(2)Mo sub(1.5)Cu sub(1.1)Fe72.5Si14.2B8 .7Nb2Mo1.5Cu1.1 target onto monocrystalline Si substr...

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Bibliographic Details
Published in:Journal of magnetism and magnetic materials 2016-10, Vol.415, p.61-65
Main Authors: Mikhalitsynaa, E A, Kataeva, V A, Larranagab, A, Lepalovskija, V N, Turygina, A P
Format: Article
Language:English
Subjects:
Annealing
Coercive force
Coercivity
Diffraction
Film thickness
Magnetic properties
Thickness
Thin films
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Summary:This paper surveys structure and magnetic properties of the thin films with thicknesses of 30, 70, 100 and 200 nm, prepared by high-frequency ion-plasma sputtering of Fe sub(72.5)Si sub(14.2)B sub(8.7)Nb sub(2)Mo sub(1.5)Cu sub(1.1)Fe72.5Si14.2B8 .7Nb2Mo1.5Cu1.1 target onto monocrystalline Si substrates. As-deposited films exhibited the roentgen-amorphous state and in-plane induced magnetic anisotropy. Their crystallization and drastic growth of the grains up to 40 nm at 460 degree C were revealed and examined by X-ray diffraction methods. Among the measured magnetic properties of the films, the magnetic anisotropy and coercivity were stressed. Their changes with the annealing temperature and film thickness were discussed. The influence of the surface roughness on the coercivity was also investigated with atomic force microscopy.
ISSN:0304-8853
DOI:10.1016/j.jmmm.2016.01.040