Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up‐scalable one‐step method toward the deposition of a new class of dense and defect‐free metal–organic covalent network (MOCN) layers. The resulting hyper‐thin and flexible MOC...

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Bibliographic Details
Published in:Advanced materials (Weinheim) 2016-09, Vol.28 (34), p.7479-7485
Main Authors: Boscher, Nicolas D., Wang, Minghui, Perrotta, Alberto, Heinze, Katja, Creatore, Mariadriana, Gleason, Karen K.
Format: Article
Language:English
Subjects:
Buildings
Chemical vapor deposition
Covalence
Deposition
free-radical polymerization
Gas separation
iPECVD
metal-organic covalent networks
metalloporphyrins
Networks
Polymerization
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Summary:The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up‐scalable one‐step method toward the deposition of a new class of dense and defect‐free metal–organic covalent network (MOCN) layers. The resulting hyper‐thin and flexible MOCN layers exhibit outstanding gas‐separation performances for multiple gas pairs.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201601010