Near-infrared absorption enhancement in microstructured silicon by Ag film deposition

We investigate the influence of spike-like microstructures formed on the silicon surface via fs-laser scanning with different-size on its near-infrared absorption from 1200 to 2500 nm. Although the infrared absorption of the small size microstructures is obviously lower than the large size, it can b...

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Bibliographic Details
Published in:Journal of materials science. Materials in electronics 2016-09, Vol.27 (9), p.9002-9007
Main Authors: Wang, Yanchao, Gao, Jinsong, Yang, Haigui, Wang, Xiaoyi
Format: Article
Language:English
Subjects:
Absorption
Characterization and Evaluation of Materials
Chemistry and Materials Science
Deposition
Infrared absorption
Materials Science
Microstructure
Near infrared radiation
Optical and Electronic Materials
Silicon
Surface chemistry
Thin films
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Summary:We investigate the influence of spike-like microstructures formed on the silicon surface via fs-laser scanning with different-size on its near-infrared absorption from 1200 to 2500 nm. Although the infrared absorption of the small size microstructures is obviously lower than the large size, it can be further improved to 90 % by a large amount of random and irregular Ag nano particles from a subsequent deposition of Ag thin film. The origins of absorption enhancement are discussed and theoretically analyzed in detail.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-016-4932-4