From Self-assembled Monolayers to Chemically Patterned Brushes： Controlling the Orientation of Block Copolymer Domains in Films by Substrate Modification

Block copolymer lithography is emerging as one of the leading technologies for patteming nanoscale dense features. In almost all potential applications of this technology, control over the orientation of cylindrical and lamellar domains is required for pattern transfer from the block copolymer film....

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Bibliographic Details
Published in:Chinese journal of polymer science 2016-06, Vol.34 (6), p.659-659
Main Authors: Jin, Xiao-sa, Pang, Yuan-yuan, Ji, Sheng-xiang
Format: Article
Language:English
Subjects:
Assembly
Block copolymers
Brushes
Characterization and Evaluation of Materials
Chemistry
Chemistry and Materials Science
Condensed Matter Physics
Industrial Chemistry/Chemical Engineering
Lithography
Orientation
Patterning
Polymer Sciences
Review
Self-assembled monolayers
Substrates
修改
化学
图案化
基板
嵌段共聚物
控制
结构域
自组装单分子膜
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Summary:Block copolymer lithography is emerging as one of the leading technologies for patteming nanoscale dense features. In almost all potential applications of this technology, control over the orientation of cylindrical and lamellar domains is required for pattern transfer from the block copolymer film. This review highlights the state-of-art development of brushes to modify the substrates to control the assembly behaviors of block copolymers in films. Selected important contributions to the development of self-assembled monolayers, polymer brushes and mats, and chemically patterned brushes are discussed.
ISSN:0256-7679
1439-6203
DOI:10.1007/s10118-016-1800-x