Fourier-transform spectral interferometry for in situ group delay dispersion monitoring of thin film coating processes

A fast Fourier-based measurement system to determine phase, group delay, and group delay dispersion during optical coating processes is proposed. The in situ method is based on a Michelson interferometer with a broad band light source and a very fast spectrometer. To our knowledge, group delay dispe...

Full description

Saved in:
Bibliographic Details
Published in:Optics express 2016-10, Vol.24 (20), p.22516-22527
Main Authors: Schlichting, Sebastian, Willemsen, Thomas, Ehlers, Henrik, Morgner, Uwe, Ristau, Detlev
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A fast Fourier-based measurement system to determine phase, group delay, and group delay dispersion during optical coating processes is proposed. The in situ method is based on a Michelson interferometer with a broad band light source and a very fast spectrometer. To our knowledge, group delay dispersion measurements directly on the moving substrates during a deposition process for complex interference coatings have been demonstrated for the first time. Especially for the very precise production of chirped mirrors it is advantageous to get information about the phase properties of the grown layer stack to react on errors and retrieve more information about the coating process.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.24.022516