Graded-index thin-film stack for cladding and coupling

A graded-index multilayer thin-film stack is optimized to act as a cladding layer on top of a silicon (Si) nanowaveguide and also a collimator for chip coupling where the waveguide ends. The numerical example shows an optimized graded-index profile from 2.35 to 1.45 provides an optical coupling to t...

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Bibliographic Details
Published in:Applied optics (2004) 2016-08, Vol.55 (24), p.6752-6756
Main Authors: Lim, Kim Peng, Ng, Doris Keh Ting, Pu, Jing, Toh, Yeow Teck, Febiana, Tjiptoharsono, Vivek, Krishnamurthy, Wang, Qian
Format: Article
Language:English
Subjects:
Cladding
Coupling
Nanostructure
Silicon
Silicon oxynitride
Stacks
Thin films
Waveguides
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Summary:A graded-index multilayer thin-film stack is optimized to act as a cladding layer on top of a silicon (Si) nanowaveguide and also a collimator for chip coupling where the waveguide ends. The numerical example shows an optimized graded-index profile from 2.35 to 1.45 provides an optical coupling to the standard single-mode fiber with efficiency close to 90% while retaining tight light confinement for the Si nanowaveguide. The corresponding material realization of a graded-index profile with a Si-rich nitride SiN /SiON/SiO system is explored using inductively coupled plasma chemical vapor deposition, and a SiN cladded Si waveguide is demonstrated.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.55.006752