Photopolymerization of Acrylate Films under an Imposed Spatial Irradiation: Thermodynamics of Relief Self-Development

UV irradiation through a lined mask of acrylate-based self-developing materials leads to the formation of a relief in the irradiated areas. Investigation of the effect of various properties, through a known two-layer model, showed the paramount importance of surface state on relief height. Both reli...

Full description

Saved in:
Bibliographic Details
Published in:Journal of colloid and interface science 1997-08, Vol.192 (1), p.149-155
Main Authors: Lavielle, L., Croutxé-Barghorn, C., Schuller, E., Lougnot, D.-J.
Format: Article
Language:English
Subjects:
acrylate
Applied sciences
Exact sciences and technology
photopolymer
Physicochemistry of polymers
Polymerization
Polymers and radiations
relief
self-development
surface thermodynamics
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:UV irradiation through a lined mask of acrylate-based self-developing materials leads to the formation of a relief in the irradiated areas. Investigation of the effect of various properties, through a known two-layer model, showed the paramount importance of surface state on relief height. Both relief height and inhibition time of the growing kinetics are shown to be directly dependent on two surface properties: surface free energy and viscosity of the condensed state of the gaseous atmosphere adjoining the film.
ISSN:0021-9797
1095-7103
DOI:10.1006/jcis.1997.4972