Mechanism of HF etching of silicon surfaces : a theoretical understanding of hydrogen passivation

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Bibliographic Details
Published in:Physical review letters 1990-07, Vol.65 (4), p.504-507
Main Authors: TRUCKS, G. W, RAGHAVACHARI, K, HIGASHI, G. S, CHABAL, Y. J
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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ISSN:0031-9007
1079-7114
DOI:10.1103/physrevlett.65.504