Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules

Interstitial O3 molecules in 7.9 eV photon-irradiated silica are identified. Their optical absorption band at 4.8 eV nearly coincides with the 4.8 eV band of nonbridging oxygen hole centers. The O3-related band is distinguished by a smaller halfwidth (0.84 vs 1. 05 eV), by susceptibility to ultravio...

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Published in:Physical review letters 2000-01, Vol.84 (2), p.302-305
Main Authors: Skuja, L, Hirano, M, Hosono, H
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Hosono, H
description Interstitial O3 molecules in 7.9 eV photon-irradiated silica are identified. Their optical absorption band at 4.8 eV nearly coincides with the 4.8 eV band of nonbridging oxygen hole centers. The O3-related band is distinguished by a smaller halfwidth (0.84 vs 1. 05 eV), by susceptibility to ultraviolet bleaching, by lack of correlation to the 1.9 eV luminescence band, and by rise of a singlet O2 luminescence band at 0.974 eV during photobleaching. This identification solves a long controversy on the nature of optical bands in silica and gives a tool for studying the mobility of atomic oxygen in SiO2.
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fullrecord <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_proquest_miscellaneous_1859334451</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1859334451</sourcerecordid><originalsourceid>FETCH-LOGICAL-p209t-1183209a98284c74c3676a6868135189ef246e41032096708d02a8d9381d3e933</originalsourceid><addsrcrecordid>eNo10EtLxDAQB_AgiLuufgEP0qOXrpkkTRNvsviClRUf5xLb6RpJHzapWD-9EdfTDMNvBuZPyAnQJQDl5w9vk3_EzzWGsFRiySnbI3OguU5zADEjh96_U0qBSXVAZnEFMqXlnNxvvqYttumAzgSsEtuGwbbelkmFNZbBx0mydcb7KXmyG3bxK3DwwQZrXNJ9dy0mTeewHB36I7JfG-fxeFcX5OX66nl1m643N3ery3XaM6pDCqB4bIxWTIkyFyWXuTRSSQU8A6WxZkKiiH9FJXOqKsqMqjRXUHHUnC_I2d_dfug-RvShaKwv0TnTYjf6AlQWlRAZRHq6o-Nrg1XRD7Yxw1T8R8B_AH2eXEw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1859334451</pqid></control><display><type>article</type><title>Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules</title><source>American Physical Society:Jisc Collections:APS Read and Publish 2023-2025 (reading list)</source><creator>Skuja, L ; Hirano, M ; Hosono, H</creator><creatorcontrib>Skuja, L ; Hirano, M ; Hosono, H</creatorcontrib><description>Interstitial O3 molecules in 7.9 eV photon-irradiated silica are identified. Their optical absorption band at 4.8 eV nearly coincides with the 4.8 eV band of nonbridging oxygen hole centers. The O3-related band is distinguished by a smaller halfwidth (0.84 vs 1. 05 eV), by susceptibility to ultraviolet bleaching, by lack of correlation to the 1.9 eV luminescence band, and by rise of a singlet O2 luminescence band at 0.974 eV during photobleaching. This identification solves a long controversy on the nature of optical bands in silica and gives a tool for studying the mobility of atomic oxygen in SiO2.</description><identifier>EISSN: 1079-7114</identifier><identifier>DOI: 10.1103/PhysRevLett.84.302</identifier><identifier>PMID: 11015896</identifier><language>eng</language><publisher>United States</publisher><ispartof>Physical review letters, 2000-01, Vol.84 (2), p.302-305</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/11015896$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Skuja, L</creatorcontrib><creatorcontrib>Hirano, M</creatorcontrib><creatorcontrib>Hosono, H</creatorcontrib><title>Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules</title><title>Physical review letters</title><addtitle>Phys Rev Lett</addtitle><description>Interstitial O3 molecules in 7.9 eV photon-irradiated silica are identified. Their optical absorption band at 4.8 eV nearly coincides with the 4.8 eV band of nonbridging oxygen hole centers. The O3-related band is distinguished by a smaller halfwidth (0.84 vs 1. 05 eV), by susceptibility to ultraviolet bleaching, by lack of correlation to the 1.9 eV luminescence band, and by rise of a singlet O2 luminescence band at 0.974 eV during photobleaching. This identification solves a long controversy on the nature of optical bands in silica and gives a tool for studying the mobility of atomic oxygen in SiO2.</description><issn>1079-7114</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNo10EtLxDAQB_AgiLuufgEP0qOXrpkkTRNvsviClRUf5xLb6RpJHzapWD-9EdfTDMNvBuZPyAnQJQDl5w9vk3_EzzWGsFRiySnbI3OguU5zADEjh96_U0qBSXVAZnEFMqXlnNxvvqYttumAzgSsEtuGwbbelkmFNZbBx0mydcb7KXmyG3bxK3DwwQZrXNJ9dy0mTeewHB36I7JfG-fxeFcX5OX66nl1m643N3ery3XaM6pDCqB4bIxWTIkyFyWXuTRSSQU8A6WxZkKiiH9FJXOqKsqMqjRXUHHUnC_I2d_dfug-RvShaKwv0TnTYjf6AlQWlRAZRHq6o-Nrg1XRD7Yxw1T8R8B_AH2eXEw</recordid><startdate>20000110</startdate><enddate>20000110</enddate><creator>Skuja, L</creator><creator>Hirano, M</creator><creator>Hosono, H</creator><scope>NPM</scope><scope>7X8</scope></search><sort><creationdate>20000110</creationdate><title>Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules</title><author>Skuja, L ; Hirano, M ; Hosono, H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p209t-1183209a98284c74c3676a6868135189ef246e41032096708d02a8d9381d3e933</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Skuja, L</creatorcontrib><creatorcontrib>Hirano, M</creatorcontrib><creatorcontrib>Hosono, H</creatorcontrib><collection>PubMed</collection><collection>MEDLINE - Academic</collection><jtitle>Physical review letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Skuja, L</au><au>Hirano, M</au><au>Hosono, H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules</atitle><jtitle>Physical review letters</jtitle><addtitle>Phys Rev Lett</addtitle><date>2000-01-10</date><risdate>2000</risdate><volume>84</volume><issue>2</issue><spage>302</spage><epage>305</epage><pages>302-305</pages><eissn>1079-7114</eissn><abstract>Interstitial O3 molecules in 7.9 eV photon-irradiated silica are identified. Their optical absorption band at 4.8 eV nearly coincides with the 4.8 eV band of nonbridging oxygen hole centers. The O3-related band is distinguished by a smaller halfwidth (0.84 vs 1. 05 eV), by susceptibility to ultraviolet bleaching, by lack of correlation to the 1.9 eV luminescence band, and by rise of a singlet O2 luminescence band at 0.974 eV during photobleaching. This identification solves a long controversy on the nature of optical bands in silica and gives a tool for studying the mobility of atomic oxygen in SiO2.</abstract><cop>United States</cop><pmid>11015896</pmid><doi>10.1103/PhysRevLett.84.302</doi><tpages>4</tpages></addata></record>
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title Oxygen-related intrinsic defects in glassy SiO2: interstitial ozone molecules
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T09%3A30%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Oxygen-related%20intrinsic%20defects%20in%20glassy%20SiO2:%20interstitial%20ozone%20molecules&rft.jtitle=Physical%20review%20letters&rft.au=Skuja,%20L&rft.date=2000-01-10&rft.volume=84&rft.issue=2&rft.spage=302&rft.epage=305&rft.pages=302-305&rft.eissn=1079-7114&rft_id=info:doi/10.1103/PhysRevLett.84.302&rft_dat=%3Cproquest_pubme%3E1859334451%3C/proquest_pubme%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-p209t-1183209a98284c74c3676a6868135189ef246e41032096708d02a8d9381d3e933%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1859334451&rft_id=info:pmid/11015896&rfr_iscdi=true