Engineering Surfaces through Sequential Stop-Flow Photopatterning

Solution‐exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet‐printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical rea...

Full description

Saved in:
Bibliographic Details
Published in:Advanced materials (Weinheim) 2016-11, Vol.28 (42), p.9292-9300
Main Authors: Pester, Christian W., Narupai, Benjaporn, Mattson, Kaila M., Bothman, David P., Klinger, Daniel, Lee, Kenneth W., Discekici, Emre H., Hawker, Craig J.
Format: Article
Language:English
Subjects:
Arrays
Engineers
Exchange
flow chemistry
Lenses
Lithography
Modular engineering
patterning
Photochemical reactions
photochemistry
polymer surfaces
Substrates
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Solution‐exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet‐printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.201602900