Engineering Surfaces through Sequential Stop-Flow Photopatterning

Solution‐exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet‐printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical rea...

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Published in:Advanced materials (Weinheim) 2016-11, Vol.28 (42), p.9292-9300
Main Authors: Pester, Christian W., Narupai, Benjaporn, Mattson, Kaila M., Bothman, David P., Klinger, Daniel, Lee, Kenneth W., Discekici, Emre H., Hawker, Craig J.
Format: Article
Language:English
Subjects:
Arrays
Engineers
Exchange
flow chemistry
Lenses
Lithography
Modular engineering
patterning
Photochemical reactions
photochemistry
polymer surfaces
Substrates
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container_issue 42
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container_title Advanced materials (Weinheim)
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creator Pester, Christian W.
Narupai, Benjaporn
Mattson, Kaila M.
Bothman, David P.
Klinger, Daniel
Lee, Kenneth W.
Discekici, Emre H.
Hawker, Craig J.
description Solution‐exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet‐printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.
doi_str_mv 10.1002/adma.201602900
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1521-4095
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source Wiley-Blackwell Read & Publish Collection
subjects Arrays
Engineers
Exchange
flow chemistry
Lenses
Lithography
Modular engineering
patterning
Photochemical reactions
photochemistry
polymer surfaces
Substrates
title Engineering Surfaces through Sequential Stop-Flow Photopatterning
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