Ion Micro Beam, promising methods for interdisciplinary research

An increasing attractiveness of top-down nanotechnology using nuclear microprobe techniques have been gathered to the micro and nano patterning process for polymers. This paper presents the research activity on innovative promising techniques able to produce three- dimensional (3D) micro-structures...

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Bibliographic Details
Published in:Journal of instrumentation 2016-05, Vol.11 (5), p.C05001-C05001
Main Authors: Cutroneo, M., Havranek, V., Torrisi, L., Svecova, B.
Format: Article
Language:English
Subjects:
Beams (radiation)
Etching
Instrumentation
Nanostructure
Nanotechnology
Patterning
Polymethyl methacrylates
Resists
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Summary:An increasing attractiveness of top-down nanotechnology using nuclear microprobe techniques have been gathered to the micro and nano patterning process for polymers. This paper presents the research activity on innovative promising techniques able to produce three- dimensional (3D) micro-structures in polymeric resists as well as to obtain images of fabricated nanostructures at Tandetron Laboratory (LT) of the Nuclear Physics Institute in Rez (Czech Republic). The Proton Beam Writing (PBW) technique was used to irradiate PMMA resist with energy of MeVs protons. The fabricated patterns were developed in chemical bath using different etching rates. An overview of micro-scale structures have been fabricated selecting the beam, the energy, the fluence and the exposition time. The produced structures were investigated by different analysis techniques among which Scanning Transmission Ion Microscopy (STIM). The characterizations of the fabricated microtunnels are presented and discussed.
ISSN:1748-0221
1748-0221
DOI:10.1088/1748-0221/11/05/C05001