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Mechanical properties and drug release of microcapsules containing quaternized‐chitosan‐modified reduced graphene oxide in the capsular wall

ABSTRACT Reduced graphene oxide (rGO) sheets were first modified with 2‐hydroxypropyltrimethyl ammonium chloride chitosan (HACC), and these modified rGO sheets (named HACC–rGO) were used as reinforcement materials and introduced to the walls of chitosan (CS) microcapsules. All of the monodisperse mi...

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Published in:Journal of applied polymer science 2017-03, Vol.134 (10), p.n/a
Main Authors: Xue, Wuzi, Chen, Yanjun, Chen, Hao, Xia, Yuanling
Format: Article
Language:English
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Summary:ABSTRACT Reduced graphene oxide (rGO) sheets were first modified with 2‐hydroxypropyltrimethyl ammonium chloride chitosan (HACC), and these modified rGO sheets (named HACC–rGO) were used as reinforcement materials and introduced to the walls of chitosan (CS) microcapsules. All of the monodisperse microcapsules were conveniently generated by a gas–liquid microfluidic technique. The results of scanning electron microscopy, X‐ray diffraction, and thermogravimetric analysis all demonstrate that the HACC–rGO sheets existed and were dispersed in the capsular shell. The HACC–rGO‐reinforced CS microcapsules showed better mechanical strength and better chemical stability with an α‐cyclodextrin solution than the CS microcapsules without HACC–rGO. Importantly, the HACC–rGO‐reinforced CS microcapsules exhibited a slower drug‐release behavior and provide a method for the control of the release rate of drug‐loaded microcapsules. In an in vitro cytotoxicity evaluation by a 3‐(4,5‐dimethyl‐2‐thiazolyl)‐2,5‐diphenyl‐2‐H‐tetrazolium bromide assay, the Schwann cells still showed good cell viability after they were treated by extracts of the CS/HACC–rGO microcapsules with concentrations ranging from 0.02 to 2000 μg/mL. Therefore, the HACC–rGO‐reinforced CS microcapsules are promising for applications in the fields of drug delivery and controlled release. © 2016 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2017, 134, 44549.
ISSN:0021-8995
1097-4628
DOI:10.1002/app.44549