Mathematical Modeling of Chemical Vapor Deposition of Material on a Curvilinear Surface

In this work, a mathematical model has been constructed that describes the process of chemical vapor deposition of material on a curvilinear plate. On the boundary where the deposition occurs, account is taken of convective heat transfer, heat transfer by radiation, and heat and mass transfer during...

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Bibliographic Details
Published in:Journal of engineering physics and thermophysics 2016-11, Vol.89 (6), p.1374-1379
Main Authors: Kuvyrkin, G. N., Zhuravskii, A. V., Savel′eva, I. Yu
Format: Article
Language:English
Subjects:
Analysis
Attachment
Boundaries
Chemical vapor deposition
Classical Mechanics
Complex Systems
Construction materials
Deposition
Engineering
Engineering Thermodynamics
Heat and Mass Transfer
Industrial Chemistry/Chemical Engineering
Mass transfer
Mathematical models
Numerical analysis
Thermodynamics
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Summary:In this work, a mathematical model has been constructed that describes the process of chemical vapor deposition of material on a curvilinear plate. On the boundary where the deposition occurs, account is taken of convective heat transfer, heat transfer by radiation, and heat and mass transfer during the attachment of the substance to the surface. A numerical algorithm is proposed for finding the temperature profile at any instant of time; results and an analysis of numerical calculation are given for different materials.
ISSN:1062-0125
1573-871X
DOI:10.1007/s10891-016-1504-7