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Temperature Compensation by Calibration Transfer for an AC Voltammetric Analyzer of Electroplating Baths

The application of methods for mitigating the effects of temperature fluctuations on the analytical performance of an in‐situ DC‐ and AC‐voltammetric sensor employed for electroplating process control in semiconductor manufacturing is presented. This sensor is a part of an automated analytical syste...

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Bibliographic Details
Published in:Electroanalysis (New York, N.Y.) N.Y.), 2017-01, Vol.29 (1), p.67-76
Main Authors: Jaworski, Aleksander, Wikiel, Hanna, Wikiel, Kazimierz
Format: Article
Language:English
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Summary:The application of methods for mitigating the effects of temperature fluctuations on the analytical performance of an in‐situ DC‐ and AC‐voltammetric sensor employed for electroplating process control in semiconductor manufacturing is presented. This sensor is a part of an automated analytical system capable of predicting concentration values of deliberately‐added bath constituents based on the component‐specific multivariate voltammetric responses. However, these responses include physicochemical phenomena, some of which are strongly dependent on temperature; therefore temperature fluctuations can produce an additional source of variance in the voltammetric responses adversely affecting the accuracy of analyte concentration predictions. Several calibration‐transfer‐based techniques, both discrete and continuous, using Piecewise Direct Standardization and Direct Standardization combined with PCR and PLS analytical models are comparatively validated for temperature compensation using AC voltammetric data for the example of accelerator additive. An extension of implementation of continuous methods for Direct Standardization is proposed along with an introduction of a new hybrid method of Standardization Models.
ISSN:1040-0397
1521-4109
DOI:10.1002/elan.201600488