Electron Probe Measurements of Oxide Film Thickness on Silicon Surfaces

An electron probe method for measuring the thickness of oxide films on silicon surfaces is proposed. The measurement range, lateral resolution, and measurement errors are estimated.

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Bibliographic Details
Published in:Measurement techniques 2015-12, Vol.58 (9), p.953-957
Main Authors: Gavrilenko, V. P., Kuzin, A. Yu, Mityukhlyaev, V. B., Stepovich, M. A., Todua, P. A., Filippov, M. N.
Format: Article
Language:English
Subjects:
Analytical Chemistry
Characterization and Evaluation of Materials
Electron probes
Energy
Error analysis
Errors
Measurement Science and Instrumentation
Measurement techniques
Nanometrology
Oxide coatings
Physical Chemistry
Physics
Physics and Astronomy
Radiation
Scanning electron microscopy
Silicon
Thickness
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Description
Summary:An electron probe method for measuring the thickness of oxide films on silicon surfaces is proposed. The measurement range, lateral resolution, and measurement errors are estimated.
ISSN:0543-1972
1573-8906
DOI:10.1007/s11018-015-0824-x