Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O 2 plasma technique was introduced as a new method for the activation and protection of...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2017-11, Vol.53 (89), p.121-1213
Main Authors: Bae, Jaeyeon, Jung, Jin-Woo, Park, Hyo Yul, Cho, Chang-Hee, Park, Jinhee
Format: Article
Language:English
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Summary:Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O 2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O 2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N 2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. HKUST-1, a representative MOF, can be both regenerated and protected against moisture deactivation by treatment with O 2 plasma.
ISSN:1359-7345
1364-548X
DOI:10.1039/c7cc05845d